Arora, PriyankaPortions of this document appear in: Arora, P., Nguyen, T., Chawla, A., Nam, S. K., & Donnelly, V. M. (2019). Role of sulfur in catalyzing fluorine atom fast etching of silicon with smooth surface morphology. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 37(6), 061303; and in: Arora, P., Cho, J., Cervantes, R., & Donnelly, V. M. (2020). Glow discharge-optical emission spectroscopy for in situ analysis of surfaces in plasmas. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 38(6), 063004; and in: Ma, T., List, T., Arora, P., & Donnelly, V. M. (2019). Recombination coefficients for Cl on plasma-conditioned yttrium oxide chamber wall surfaces. Journal of Applied Physics, 125(2), 023301; and in: List, T., Ma, T., Arora, P., Donnelly, V. M., & Shannon, S. (2019). Complex transients in power modulated inductively-coupled chlorine plasmas. Plasma Sources Science and Technology, 28(2), 025005..
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