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Wei, Yayi
360  Ergebnisse:
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1

SCAPSM: attenuated phase-shift mask structure for EUV litho..:

Li, Chen ; Dong, Lisong ; Wei, Yayi
Applied Optics.  63 (2024)  9 - p. 2263 , 2024
Link: https://doi.org/10.1364/..
 
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2

Machine learning in electron beam lithography to boost phot..:

Zhao, Rongbo ; Wang, Xiaolin ; Xu, Hong..
Nanoscale.  16 (2024)  8 - p. 4212-4218 , 2024
Link: https://doi.org/10.1039/..
 
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3

Cluster Sampling and Scalable Bayesian Optimization with Co..:

Ma, Le ; Ma, Xing ; Hao, Shaogang...
Optics Express.  , 2024
Link: https://doi.org/10.1364/..
 
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4

Dynamic budget analysis of multiple parameters in lithograp..:

wang, jiashuo ; Su, Xiaojing ; Dong, Lisong..
Optics Express.  , 2024
Link: https://doi.org/10.1364/..
 
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5

Machine Learning Applied to Electron Beam Lithography to Ac..:

Zhao, Rongbo ; Wang, Xiaolin ; Wei, Yayi..
ACS Applied Materials & Interfaces.  16 (2024)  17 - p. 22465-22470 , 2024
Link: https://doi.org/10.1021/..
 
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6

Mask structure optimization for beyond EUV lithography:

Li, Ziqi ; Dong, Lisong ; Ma, Xu.
Optics Letters.  , 2024
Link: https://doi.org/10.1364/..
 
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7

A method for optical proximity correctionbased on a vector ..:

Wu, Ruixuan ; Dong, Lisong ; Wei, Yayi
Applied Optics.  , 2024
Link: https://doi.org/10.1364/..
 
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8

Enhancement of Pattern Depth in Plasmonic Lithography for P..:

, In: 2023 China Semiconductor Technology International Conference (CSTIC),
Han, Dandan ; Wei, Yayi - p. 1-3 , 2023
Link: https://doi.org/10.1109/..
 
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9

Process and Tool Monitor and Diagnosis Based on Overlay Dat..:

, In: 2023 China Semiconductor Technology International Conference (CSTIC),
Tong, Yi ; Zhang, Libin ; Wei, Yayi.. - p. 1-3 , 2023
Link: https://doi.org/10.1109/..
 
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10

Process optimization of line patterns in extreme ultraviole..:

zhao, Rongbo ; Hu, Ziyu ; Wang, Xiaolin...
Applied Optics.  , 2023
Link: https://doi.org/10.1364/..
 
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11

Spatial modulation of scalable nanostructures by combining ..:

Han, Dandan ; Ye, Tianchun ; Wei, Yayi
Nanoscale Advances.  5 (2023)  17 - p. 4424-4434 , 2023
Link: https://doi.org/10.1039/..
 
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12

Fast imaging model of periodic patterns in plasmonic lithog..:

, In: 2023 International Workshop on Advanced Patterning Solutions (IWAPS),
Ding, Huwen ; Wei, Yayi - p. 1-5 , 2023
Link: https://doi.org/10.1109/..
 
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13

Enhancement of pattern quality in maskless plasmonic lithog..:

Han, Dandan ; Deng, Sen ; Ye, Tianchun.
Microsystems & Nanoengineering.  9 (2023)  1 - p. , 2023
Link: https://doi.org/10.1038/..
 
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14

Stochastic EUV Resist Model:

, In: 2023 International Symposium of Electronics Design Automation (ISEDA),
He, Guangjian ; Xue, Jing ; Fan, Taian. - p. 477-482 , 2023
Link: https://doi.org/10.1109/..
 
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15

DTCO optimizes critical path nets to improve chip performan..:

Zhang, Shuang ; Zhang, Libin ; Ding, Chenghong...
Applied Optics.  , 2023
Link: https://doi.org/10.1364/..
 
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