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Xu, Tian-li
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1

Robust adaptive regulation of magnetic levitation systems w..:

Sun, Zong-Yao ; Xu, Tian-Li ; Cai, Bin.
Journal of the Franklin Institute.  360 (2023)  3 - p. 1672-1689 , 2023
Link: https://doi.org/10.1016/..
 
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2

Association of serum fibroblast growth factor 19 levels wit..:

Liu, Wang-shu ; Tang, Meng-jie ; Xu, Tian-li...
Diabetology & Metabolic Syndrome.  12 (2020)  1 - p. , 2020
Link: https://doi.org/10.1186/..
 
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3

Serum fibroblast growth factor 19 and endogenous islet beta..:

Tang, Meng-jie ; Su, Jian‑bin ; Xu, Tian-li...
Diabetology & Metabolic Syndrome.  11 (2019)  1 - p. , 2019
Link: https://doi.org/10.1186/..
 
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4

High Aspect Ratio Carbon Hard Mask Etch Process for Profile..:

, In: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC),
Zhu, Meng-Jiao ; Xu, Li-Tian ; Zeng, Li.. - p. 1-3 , 2024
Link: https://doi.org/10.1109/..
 
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5

Study of Tungsten-Doped Carbon Hard Mask Etch Process Using..:

, In: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC),
Xu, Li-Tian ; Zeng, Li ; Zhu, Meng-Jiao... - p. 1-3 , 2024
Link: https://doi.org/10.1109/..
 
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6

Line Edge Roughness Reduction in High Aspect Ratio Carbon H..:

, In: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC),
Zeng, Li ; Xu, Li-Tian ; Zhu, Mengjiao - p. 1-3 , 2024
Link: https://doi.org/10.1109/..
 
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7

Investigation of High Aspect Ratio Amorphous Carbon Etching..:

, In: 2023 China Semiconductor Technology International Conference (CSTIC),
Zeng, Li ; Yang, Guang ; Jiang, Zhongwei.. - p. 1-3 , 2023
Link: https://doi.org/10.1109/..
 
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8

Deep trench (DT) etching process for power MOS device:

, In: 2023 China Semiconductor Technology International Conference (CSTIC),
Chen, Chen ; Xu, Li-Tian ; Yao, Xing-Jun - p. 1-2 , 2023
Link: https://doi.org/10.1109/..
 
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9

Study of Photo-Resist (PR) Strip Rate with High Temperature..:

, In: 2023 China Semiconductor Technology International Conference (CSTIC),
Tian, Cheng ; Xu, Li-Tian ; Hu, Li-Song. - p. 1-3 , 2023
Link: https://doi.org/10.1109/..
 
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10

Trimming of Silicon Nitride Hard Mask Using Cyclic Depositi..:

, In: 2023 China Semiconductor Technology International Conference (CSTIC),
Xu, Li-Tian ; Mei, Pei ; Yao, Xing-Jun... - p. 1-2 , 2023
Link: https://doi.org/10.1109/..
 
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11

Redistribution Layer aluminum advanced etching process deve..:

, In: 2023 China Semiconductor Technology International Conference (CSTIC),
Yao, Xing-Jun ; Xu, Li-Tian ; Qi, Li... - p. 1-2 , 2023
Link: https://doi.org/10.1109/..
 
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12

Carbon Hard Mask Opening Process Development with Novel Sid..:

, In: 2023 China Semiconductor Technology International Conference (CSTIC),
Zhu, Meng-Jiao ; Xu, Li-Tian ; Wang, Jing.. - p. 1-2 , 2023
Link: https://doi.org/10.1109/..
 
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13

Bitline etch process development for Advanced process DRAM ..:

, In: 2022 China Semiconductor Technology International Conference (CSTIC),
Yao, Xing-Jun ; Xu, Li-Tian ; Zhang, Jan-Kun... - p. 01-02 , 2022
Link: https://doi.org/10.1109/..
 
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14

SNC SADP Spacer etch process development using carbon hard ..:

, In: 2022 China Semiconductor Technology International Conference (CSTIC),
Liu, Hao ; Zhang, Jian-kun ; Zhao, Zun-hua... - p. 1-3 , 2022
Link: https://doi.org/10.1109/..
 
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15

Correction to Indole Alkaloids from a Soil-Derived Clonosta..:

Jiang, Chun-Xiao ; Yu, Bo ; Miao, Ya-Mei...
Journal of Natural Products.  85 (2022)  9 - p. 2252-2253 , 2022
Link: https://doi.org/10.1021/..
 
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