Erdmann, Andreas A.
566  Ergebnisse:
Personensuche X
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11

Advances in lithography: introduction to the feature:

Erdmann, Andreas ; Liang, Rongguang ; Sezginer, Apo.
Journal of the Optical Society of America A.  31 (2014)  12 - p. LI1 , 2014
 
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14

Resist Properties Required for 6.67 nm Extreme Ultraviolet ..:

Kozawa, Takahiro ; Erdmann, Andreas
Japanese Journal of Applied Physics.  51 (2012)  10R - p. 106701 , 2012
 
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