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2024 Conference of Science and Technology for Integrated Circuits (CSTIC) ,
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High Aspect Ratio Carbon Hard Mask Etch Process for Profile..:
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2024 Conference of Science and Technology for Integrated Circuits (CSTIC) ,
2
Study of Tungsten-Doped Carbon Hard Mask Etch Process Using..:
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2024 Conference of Science and Technology for Integrated Circuits (CSTIC) ,
3
Line Edge Roughness Reduction in High Aspect Ratio Carbon H..:
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2023 China Semiconductor Technology International Conference (CSTIC) ,
4
Investigation of High Aspect Ratio Amorphous Carbon Etching..:
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2023 China Semiconductor Technology International Conference (CSTIC) ,
5
Deep trench (DT) etching process for power MOS device:
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2023 China Semiconductor Technology International Conference (CSTIC) ,
6
Study of Photo-Resist (PR) Strip Rate with High Temperature..:
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2023 China Semiconductor Technology International Conference (CSTIC) ,
7
Trimming of Silicon Nitride Hard Mask Using Cyclic Depositi..:
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2023 China Semiconductor Technology International Conference (CSTIC) ,
8
Redistribution Layer aluminum advanced etching process deve..:
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2023 China Semiconductor Technology International Conference (CSTIC) ,
9
A Technical Optimization of Waferless Auto Clean for Alumin..:
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2023 China Semiconductor Technology International Conference (CSTIC) ,
10
Self-Limited Etching of Silicon Nitride Using Cyclic Proces..:
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2023 China Semiconductor Technology International Conference (CSTIC) ,
11
Carbon Hard Mask Opening Process Development with Novel Sid..:
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2022 China Semiconductor Technology International Conference (CSTIC) ,
12
Bitline etch process development for Advanced process DRAM ..:
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2022 China Semiconductor Technology International Conference (CSTIC) ,
13
SNC SADP Spacer etch process development using carbon hard ..:
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2022 China Semiconductor Technology International Conference (CSTIC) ,
14