Ich stimme zu, dass diese Seite Cookies verwende. Weitere Informationen finden Sie unter unseren Datenschutzerklärungen .
X
Xu, Tian-li
5034  Ergebnisse:
Buchkapitel (Online) X
Personensuche X
?
1

Study of Tungsten-Doped Carbon Hard Mask Etch Process Using..:

, In: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC),
Xu, Li-Tian ; Zeng, Li ; Zhu, Meng-Jiao... - p. 1-3 , 2024
Link: https://doi.org/10.1109/..
 
?
2

Line Edge Roughness Reduction in High Aspect Ratio Carbon H..:

, In: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC),
Zeng, Li ; Xu, Li-Tian ; Zhu, Mengjiao - p. 1-3 , 2024
Link: https://doi.org/10.1109/..
 
?
3

High Aspect Ratio Carbon Hard Mask Etch Process for Profile..:

, In: 2024 Conference of Science and Technology for Integrated Circuits (CSTIC),
Zhu, Meng-Jiao ; Xu, Li-Tian ; Zeng, Li.. - p. 1-3 , 2024
Link: https://doi.org/10.1109/..
 
?
4

Investigation of High Aspect Ratio Amorphous Carbon Etching..:

, In: 2023 China Semiconductor Technology International Conference (CSTIC),
Zeng, Li ; Yang, Guang ; Jiang, Zhongwei.. - p. 1-3 , 2023
Link: https://doi.org/10.1109/..
 
?
5

Self-Limited Etching of Silicon Nitride Using Cyclic Proces..:

, In: 2023 China Semiconductor Technology International Conference (CSTIC),
Wang, Xue-Hua ; Xu, Li-Tian ; Cheng, Tian - p. 1-2 , 2023
Link: https://doi.org/10.1109/..
 
?
6

Deep trench (DT) etching process for power MOS device:

, In: 2023 China Semiconductor Technology International Conference (CSTIC),
Chen, Chen ; Xu, Li-Tian ; Yao, Xing-Jun - p. 1-2 , 2023
Link: https://doi.org/10.1109/..
 
?
7

Study of Photo-Resist (PR) Strip Rate with High Temperature..:

, In: 2023 China Semiconductor Technology International Conference (CSTIC),
Tian, Cheng ; Xu, Li-Tian ; Hu, Li-Song. - p. 1-3 , 2023
Link: https://doi.org/10.1109/..
 
?
8

Trimming of Silicon Nitride Hard Mask Using Cyclic Depositi..:

, In: 2023 China Semiconductor Technology International Conference (CSTIC),
Xu, Li-Tian ; Mei, Pei ; Yao, Xing-Jun... - p. 1-2 , 2023
Link: https://doi.org/10.1109/..
 
?
9

Carbon Hard Mask Opening Process Development with Novel Sid..:

, In: 2023 China Semiconductor Technology International Conference (CSTIC),
Zhu, Meng-Jiao ; Xu, Li-Tian ; Wang, Jing.. - p. 1-2 , 2023
Link: https://doi.org/10.1109/..
 
?
10

Redistribution Layer aluminum advanced etching process deve..:

, In: 2023 China Semiconductor Technology International Conference (CSTIC),
Yao, Xing-Jun ; Xu, Li-Tian ; Qi, Li... - p. 1-2 , 2023
Link: https://doi.org/10.1109/..
 
?
11

A Technical Optimization of Waferless Auto Clean for Alumin..:

, In: 2023 China Semiconductor Technology International Conference (CSTIC),
Qi, Li ; Sang, Qiang-Qiang ; Yao, Xing-Jun... - p. 1-2 , 2023
Link: https://doi.org/10.1109/..
 
?
12

SNC SADP Spacer etch process development using carbon hard ..:

, In: 2022 China Semiconductor Technology International Conference (CSTIC),
Liu, Hao ; Zhang, Jian-kun ; Zhao, Zun-hua... - p. 1-3 , 2022
Link: https://doi.org/10.1109/..
 
?
13

Bitline etch process development for Advanced process DRAM ..:

, In: 2022 China Semiconductor Technology International Conference (CSTIC),
Yao, Xing-Jun ; Xu, Li-Tian ; Zhang, Jan-Kun... - p. 01-02 , 2022
Link: https://doi.org/10.1109/..
 
?
14

SADP etch process development using PR core for sub 17nm DR..:

, In: 2022 China Semiconductor Technology International Conference (CSTIC),
Xu, Li Tian ; Zhang, Shuai ; Li, Ling Feng... - p. 1-3 , 2022
Link: https://doi.org/10.1109/..
 
?
15

Contributors:

, In: Structural Health Monitoring/management (SHM) in Aerospace Structures,
Abdullah, Arif M. ; Croxford, Anthony J. ; Fakih, Mohammad Ali... - p. xi-xiii , 2024
Link: https://doi.org/10.1016/..
 
1-15