E-LIB Suche - Ergebnisse für: Ekerdt, J. G.

1

Contributions of bulk and surface energies in stabilizing m..:

Al-Quaiti, Fatima ; Chen, P.-Y. ; Ekerdt, J. G..
Physical Review Materials. 6 (2022) 4 - p. , 2022

Link: https://doi.org/10.1103/..

2

Growth and characterization of epitaxial anatase TiO2(001) ..:

McDaniel, M.D. ; Posadas, A. ; Wang, T...
Thin Solid Films. 520 (2012) 21 - p. 6525-6530 , 2012

Link: https://doi.org/10.1016/..

3

The effect of an iodine source on nucleation and film prope..:

Thom, Kelly M. ; Ekerdt, J.G.
Thin Solid Films. 518 (2009) 1 - p. 36-42 , 2009

Link: https://doi.org/10.1016/..

4

Surface chemistry of (2,4-dimethylpentadienyl)(ethylcyclope..:

Thom, Kelly M. ; Ekerdt, J.G.
Surface Science. 603 (2009) 6 - p. 921-932 , 2009

Link: https://doi.org/10.1016/..

5

Oxidation resistance of thin boron carbo-nitride films on G..:

Fitzpatrick, P.R. ; Wang, T. ; Heitsch, A.T...
Thin Solid Films. 517 (2009) 13 - p. 3686-3694 , 2009

Link: https://doi.org/10.1016/..

6

Experimental and Theoretical Investigation on Surfactant Se..:

Wu, K. ; Wang, X. ; Kim, E. K...
Langmuir. 23 (2006) 3 - p. 1166-1170 , 2006

Link: https://doi.org/10.1021/..

7

Nucleation and growth study of atomic layer deposited HfO2 ..:

Kirsch, P. D. ; Quevedo-Lopez, M. A. ; Li, H. -J....
Journal of Applied Physics. 99 (2006) 2 - p. , 2006

Link: https://doi.org/10.1063/..

8

Adhesion of Chemical Vapor Deposited Boron Carbo-nitride to..:

Engbrecht, E.R. ; Fitzpatrick, P.R. ; Junker, K.H....
Journal of Materials Research. 20 (2005) 8 - p. 2218-2224 , 2005

Link: https://doi.org/10.1557/..

9

Atomic layer deposition of TaSix thin films on SiO2 using T..:

Lemonds, A.M. ; Bolom, T. ; Ahearn, W.J....
Thin Solid Films. 488 (2005) 1-2 - p. 9-14 , 2005

Link: https://doi.org/10.1016/..

10

Low-threshold field emission from cesiated silicon nanowire:

Kulkarni, N. N. ; Bae, J. ; Shih, C.-K....
Applied Physics Letters. 87 (2005) 21 - p. , 2005

Link: https://doi.org/10.1063/..

11

Surface Hydration and Its Effect on Fluorinated SAM Formati..:

Wu, K. ; Bailey, T. C. ; Willson, C. G..
Langmuir. 21 (2005) 25 - p. 11795-11801 , 2005

Link: https://doi.org/10.1021/..

12

Ultra thin tungsten nitride film growth on dielectric surfa..:

Sun, Y.-M. ; Engbrecht, E.R. ; Bolom, T....
Thin Solid Films. 458 (2004) 1-2 - p. 251-256 , 2004

Link: https://doi.org/10.1016/..

13

Low-temperature chemical vapor deposition and scaling limit..:

Wang, Q. ; Ekerdt, J. G. ; Gay, D...
Applied Physics Letters. 84 (2004) 8 - p. 1380-1382 , 2004

Link: https://doi.org/10.1063/..

14

Surface science investigations of atomic layer deposition h..:

Lemonds, A.M ; White, J.M ; Ekerdt, J.G
Surface Science. 538 (2003) 3 - p. 191-203 , 2003

Link: https://doi.org/10.1016/..

15

Improved step and flash imprint lithography templates for n..:

Resnick, D.J. ; Mancini, D. ; Dauksher, W.J....
Microelectronic Engineering. 69 (2003) 2-4 - p. 412-419 , 2003

Link: https://doi.org/10.1016/..