E-LIB Suche - Ergebnisse für: Urabe, Keiichiro

1

Optical and electrical evaluation methods of plasma-induced..:

Goya, Takahiro ; Urabe, Keiichiro ; Eriguchi, Koji
Japanese Journal of Applied Physics. 63 (2024) 6 - p. 06SP04 , 2024

Link: https://doi.org/10.35848..

2

Time-resolved laser-induced fluorescence spectroscopy using..:

Takahashi, Ryosuke ; Kito, Seiya ; Eriguchi, Koji.
Review of Scientific Instruments. 95 (2024) 5 - p. , 2024

Link: https://doi.org/10.1063/..

3

Study on Ion Flux From Magnetically Confined Low-Pressure A..:

Asamoto, Yuya ; Urabe, Keiichiro ; Matsuda, Takayuki...
IEEE Transactions on Plasma Science. , 2024

Link: https://doi.org/10.1109/..

4

Investigation of small-fraction molecular impurities in hig..:

Urabe, Keiichiro ; Toyoda, Minami ; Matsuoka, Yoshinori.
Plasma Sources Science and Technology. 33 (2024) 2 - p. 025011 , 2024

Link: https://doi.org/10.1088/..

5

In situ electrical monitoring of SiO2/Si structures in low-..:

Morozumi, Junki ; Goya, Takahiro ; Kuyama, Tomohiro..
Japanese Journal of Applied Physics. 62 (2023) SI - p. SI1010 , 2023

Link: https://doi.org/10.35848..

6

Spectroscopic ellipsometry characterization of boron nitrid..:

Hamano, Takashi ; Matsuda, Takayuki ; Asamoto, Yuya...
Applied Physics Letters. 120 (2022) 3 - p. , 2022

Link: https://doi.org/10.1063/..

7

Characterization of Plasma Process-Induced Low-Density Defe..:

Sato, Yoshihiro ; Shibata, Satoshi ; Yamada, Takayoshi...
IEEE Journal of the Electron Devices Society. 10 (2022) - p. 769-777 , 2022

Link: https://doi.org/10.1109/..

8

Quantitative evaluation of plasma-damaged SiN/Si structures..:

Kuyama, Tomohiro ; Urabe, Keiichiro ; Eriguchi, Koji
Journal of Applied Physics. 131 (2022) 13 - p. , 2022

Link: https://doi.org/10.1063/..

9

Multi-harmonic analysis in a floating harmonic probe method..:

Kito, Seiya ; Urabe, Keiichiro ; Eriguchi, Koji
Japanese Journal of Applied Physics. 61 (2022) 10 - p. 106002 , 2022

Link: https://doi.org/10.35848..

10

Electron number density measurements in nanosecond repetiti..:

Sainct, Florent P ; Urabe, Keiichiro ; Pannier, Erwan..
Plasma Sources Science and Technology. 29 (2020) 2 - p. 025017 , 2020

Link: https://doi.org/10.1088/..

11

Characterization of dynamic behaviors of defects in Si subs..:

Kuyama, Tomohiro ; Urabe, Keiichiro ; Fukawsawa, Masanaga..
Japanese Journal of Applied Physics. 59 (2020) SJ - p. SJJC02 , 2020

Link: https://doi.org/10.35848..

12

5 Model analysis for effects of spatial and energy profiles..:

, In: 2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD),

Hamano, Takashi ; Urabe, Keiichiro ; Eriguchi, Koji - p. 125-127 , 2020

Link: https://doi.org/10.23919..

13

Characterization of surface modification mechanisms for bor..:

Higuchi, Tomoya ; Noma, Masao ; Yamashita, Michiru...
Surface and Coatings Technology. 377 (2019) - p. 124854 , 2019

Link: https://doi.org/10.1016/..

14

Improvement of the plasma‐induced defect generation model i..:

Eriguchi, Koji ; Hamano, Takashi ; Urabe, Keiichiro
Plasma Processes and Polymers. 16 (2019) 9 - p. , 2019

Link: https://doi.org/10.1002/..

15

Investigation of spatial and energy profiles of plasma proc..:

Hamano, Takashi ; Urabe, Keiichiro ; Eriguchi, Koji
Journal of Physics D: Applied Physics. , 2019

Link: https://doi.org/10.1088/..