E-LIB Suche - Ergebnisse für: Dong, Lisong

1

SCAPSM: attenuated phase-shift mask structure for EUV litho..:

Li, Chen ; Dong, Lisong ; Wei, Yayi
Applied Optics. 63 (2024) 9 - p. 2263 , 2024

Link: https://doi.org/10.1364/..

2

Cluster Sampling and Scalable Bayesian Optimization with Co..:

Ma, Le ; Ma, Xing ; Hao, Shaogang...
Optics Express. , 2024

Link: https://doi.org/10.1364/..

3

Dynamic budget analysis of multiple parameters in lithograp..:

wang, jiashuo ; Su, Xiaojing ; Dong, Lisong..
Optics Express. , 2024

Link: https://doi.org/10.1364/..

4

Mask structure optimization for beyond EUV lithography:

Li, Ziqi ; Dong, Lisong ; Ma, Xu.
Optics Letters. , 2024

Link: https://doi.org/10.1364/..

5

A method for optical proximity correctionbased on a vector ..:

Wu, Ruixuan ; Dong, Lisong ; Wei, Yayi
Applied Optics. , 2024

Link: https://doi.org/10.1364/..

6

Synergistic dispersion and tribo‐film formation of liquid m..:

Nie, Yuxiang ; Zhou, Xiaoyao ; Dong, Lisong...
Polymer Composites. 44 (2023) 8 - p. 4815-4825 , 2023

Link: https://doi.org/10.1002/..

7

Liquid metal @ mxene spring supports ionic gel with excelle..:

Dong, Lisong ; Zhou, Xiaoyao ; Zheng, Shuxin...
Chemical Engineering Journal. 458 (2023) - p. 141370 , 2023

Link: https://doi.org/10.1016/..

8

Sustainable composites from Carbon Dioxide-Derived Poly (pr..:

Zhao, Ling ; Jia, Shiling ; Zheng, Gaofei...
Composites Communications. 43 (2023) - p. 101701 , 2023

Link: https://doi.org/10.1016/..

9

Decomposition-learning-based thick-mask model for partially..:

Li, Ziqi ; Dong, Lisong ; Ma, Xu.
Optics Express. , 2023

Link: https://doi.org/10.1364/..

10

Fast diffraction model of an EUV mask based on asymmetric p..:

Li, Ziqi ; Jing, Xuyu ; Dong, Lisong..
Applied Optics. 62 (2023) 25 - p. 6561 , 2023

Link: https://doi.org/10.1364/..

11

Aberration budget analysis of EUV lithography from the imag..:

Chen, Zhishu ; Dong, Lisong ; Ding, Huwen.
Applied Optics. 62 (2023) 27 - p. 7270 , 2023

Link: https://doi.org/10.1364/..

12

Fast aerial image model for EUV lithography using the adjoi..:

Lin, Jiaxin ; Dong, Lisong ; Fan, Taian..
Optics Express. 30 (2022) 7 - p. 11944 , 2022

Link: https://doi.org/10.1364/..

13

High-precision lithography thick-mask model based on a deco..:

Li, Ziqi ; Dong, Lisong ; Jing, Xuyu..
Optics Express. 30 (2022) 11 - p. 17680 , 2022

Link: https://doi.org/10.1364/..

14

Study on forbidden pitch in plasmonic lithography: taking 3..:

Ding, Huwen ; Liu, Lihong ; Dong, Lisong...
Optics Express. 30 (2022) 19 - p. 33869 , 2022

Link: https://doi.org/10.1364/..

15

Plasmonic lithography fast imaging model based on the decom..:

Ding, Huwen ; Liu, Lihong ; Li, Ziqi...
Optics Express. 31 (2022) 1 - p. 192 , 2022

Link: https://doi.org/10.1364/..