E-LIB Suche - Ergebnisse für: Efremov, Alexander

1

Synthesis of a Controller Built on the Principle of Inverse..:

Efremov, Alexander ; Bikineeva, Alexandra ; Korzun, Fedor..
E3S Web of Conferences. 446 (2023) - p. 05005 , 2023

Link: https://doi.org/10.1051/..

2

On Relationships between Plasma Chemistry and Surface React..:

Baek, Seung Yong ; Efremov, Alexander ; Bobylev, Alexander..
Materials. 16 (2023) 14 - p. 5043 , 2023

Link: https://doi.org/10.3390/..

3

Noble gas effect on ACL etching selectivity to SiO2 films:

Choi, Gilyoung ; Efremov, Alexander ; Son, Hye Jun.
Plasma Processes and Polymers. 20 (2023) 8 - p. , 2023

Link: https://doi.org/10.1002/..

4

Gas-phase parameters and densities of atomic species in Cl2..:

Efremov, Alexander ; Amirov, Ildar ; Izyumov, Mikhail
Vacuum. 207 (2023) - p. 111664 , 2023

Link: https://doi.org/10.1016/..

5

UiO-66 framework with an encapsulated spin probe: synthesis..:

Poryvaev, Artem S. ; Larionov, Kirill P. ; Albrekht, Yana N....
Physical Chemistry Chemical Physics. 25 (2023) 20 - p. 13846-13853 , 2023

Link: https://doi.org/10.1039/..

6

Individual Effects of Various Plasma-Related Factors on the..:

Son, Hye Jun ; Efremov, Alexander ; Choi, Gilyoung.
Plasma Chemistry and Plasma Processing. 44 (2023) 1 - p. 635-649 , 2023

Link: https://doi.org/10.1007/..

7

On mechanisms to control SiO2 etching kinetics in low-power..:

Choi, Gilyoung ; Efremov, Alexander ; Lee, Dae-Kug..
Vacuum. 216 (2023) - p. 112484 , 2023

Link: https://doi.org/10.1016/..

8

Etching kinetics and dielectric properties of SiOC films ex..:

Oh, Younghun ; Efremov, Alexander ; Lee, Junmyung...
Thin Solid Films. 749 (2022) - p. 139185 , 2022

Link: https://doi.org/10.1016/..

9

On mechanisms influencing etching/polymerization balance in..:

Efremov, Alexander ; Son, Hye Jun ; Choi, Gilyoung.
Vacuum. 206 (2022) - p. 111518 , 2022

Link: https://doi.org/10.1016/..

10

Vacuum polarization in uranium:

Efremov, Alexander
International Journal of Quantum Chemistry. 123 (2022) 4 - p. , 2022

Link: https://doi.org/10.1002/..

11

A comparison of CF4, CBrF3 and C2Br2F4 plasmas: Physical pa..:

Miakonkikh, Andrey ; Kuzmenko, Vitaly ; Efremov, Alexander.
Vacuum. 200 (2022) - p. 110991 , 2022

Link: https://doi.org/10.1016/..

12

Comparative study of Cl2 + O2 and HBr + O2 plasma chemistri..:

Lim, Nomin ; Efremov, Alexander ; Kwon, Kwang-Ho
Vacuum. 186 (2021) - p. 110043 , 2021

Link: https://doi.org/10.1016/..

13

Dry Etching Performance and Gas-Phase Parameters of C6F12O ..:

Lim, Nomin ; Choi, Yeon Sik ; Efremov, Alexander.
Materials. 14 (2021) 7 - p. 1595 , 2021

Link: https://doi.org/10.3390/..

14

A Comparison of CF4, CHF3 and C4F8 + Ar/O2 Inductively Coup..:

Lim, Nomin ; Efremov, Alexander ; Kwon, Kwang-Ho
Plasma Chemistry and Plasma Processing. 41 (2021) 6 - p. 1671-1689 , 2021

Link: https://doi.org/10.1007/..

15

Gas‐phase chemistry and reactive‐ion etching kinetics for s..:

Lee, Byung Jun ; Efremov, Alexander ; Kwon, Kwang‐Ho
Plasma Processes and Polymers. 18 (2021) 7 - p. 2000249 , 2021

Link: https://doi.org/10.1002/..