E-LIB Suche - Ergebnisse für: Wei, Yayi

1

SCAPSM: attenuated phase-shift mask structure for EUV litho..:

Li, Chen ; Dong, Lisong ; Wei, Yayi
Applied Optics. 63 (2024) 9 - p. 2263 , 2024

Link: https://doi.org/10.1364/..

2

Machine learning in electron beam lithography to boost phot..:

Zhao, Rongbo ; Wang, Xiaolin ; Xu, Hong..
Nanoscale. 16 (2024) 8 - p. 4212-4218 , 2024

Link: https://doi.org/10.1039/..

3

Cluster Sampling and Scalable Bayesian Optimization with Co..:

Ma, Le ; Ma, Xing ; Hao, Shaogang...
Optics Express. , 2024

Link: https://doi.org/10.1364/..

4

Dynamic budget analysis of multiple parameters in lithograp..:

wang, jiashuo ; Su, Xiaojing ; Dong, Lisong..
Optics Express. , 2024

Link: https://doi.org/10.1364/..

5

Machine Learning Applied to Electron Beam Lithography to Ac..:

Zhao, Rongbo ; Wang, Xiaolin ; Wei, Yayi..
ACS Applied Materials & Interfaces. 16 (2024) 17 - p. 22465-22470 , 2024

Link: https://doi.org/10.1021/..

6

Mask structure optimization for beyond EUV lithography:

Li, Ziqi ; Dong, Lisong ; Ma, Xu.
Optics Letters. , 2024

Link: https://doi.org/10.1364/..

7

A method for optical proximity correctionbased on a vector ..:

Wu, Ruixuan ; Dong, Lisong ; Wei, Yayi
Applied Optics. , 2024

Link: https://doi.org/10.1364/..

8

Process optimization of line patterns in extreme ultraviole..:

zhao, Rongbo ; Hu, Ziyu ; Wang, Xiaolin...
Applied Optics. , 2023

Link: https://doi.org/10.1364/..

9

Spatial modulation of scalable nanostructures by combining ..:

Han, Dandan ; Ye, Tianchun ; Wei, Yayi
Nanoscale Advances. 5 (2023) 17 - p. 4424-4434 , 2023

Link: https://doi.org/10.1039/..

10

Enhancement of pattern quality in maskless plasmonic lithog..:

Han, Dandan ; Deng, Sen ; Ye, Tianchun.
Microsystems & Nanoengineering. 9 (2023) 1 - p. , 2023

Link: https://doi.org/10.1038/..

11

DTCO optimizes critical path nets to improve chip performan..:

Zhang, Shuang ; Zhang, Libin ; Ding, Chenghong...
Applied Optics. , 2023

Link: https://doi.org/10.1364/..

12

Generation of inverse assist features using generative adve..:

Cao, Qingchen ; Xu, Peng ; Sun, Song..
Microelectronic Engineering. 273 (2023) - p. 111951 , 2023

Link: https://doi.org/10.1016/..

13

Influence of vibration of extreme ultraviolet lithographic ..:

Shen, Hao ; Zhang, Libin ; Wei, Yayi.
Optics Express. , 2023

Link: https://doi.org/10.1364/..

14

Optical proximity correction by using unsupervised learning..:

Wei, Yayi
Applied Optics. , 2023

Link: https://doi.org/10.1364/..

15

Fast diffraction model of an EUV mask based on asymmetric p..:

Li, Ziqi ; Jing, Xuyu ; Dong, Lisong..
Applied Optics. 62 (2023) 25 - p. 6561 , 2023

Link: https://doi.org/10.1364/..