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Anyadiegwu, Clement
5  Ergebnisse:
Personensuche X
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1

Novel Diamantane Polymer Platform for Resist Applications:

Padmanaban, Murirathna ; Chakrapani, Srinivasan ; Lin, Guanyang...
Journal of Photopolymer Science and Technology.  20 (2007)  5 - p. 719-728 , 2007
Link: https://doi.org/10.2494/..
 
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2

Effect of Amine Additives on LWR and LER as Studied by Extr..:

Houlihan, Francis M. ; Rentkiewicz, David ; Lin, Guanyang...
Journal of Photopolymer Science and Technology.  19 (2006)  3 - p. 327-334 , 2006
Link: https://doi.org/10.2494/..
 
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3

193 nm Resist Line Collapse Study by Modifying the Resist P..:

Tanaka, Keiichi ; Yamada, Yoshiaki ; Masuda, Seiya...
Journal of Photopolymer Science and Technology.  17 (2004)  4 - p. 527-534 , 2004
Link: https://doi.org/10.2494/..
 
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4

Influence of ArF Resist Components and Process Conditions o..:

Padmanaban, Munirathna ; Anyadiegwu, Clement ; Kanda, Takashi...
Journal of Photopolymer Science and Technology.  16 (2003)  4 - p. 475-481 , 2003
Link: https://doi.org/10.2494/..
 
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5

Browning in processed yams: peroxidase or polyphenol oxidas..:

Chilaka, Ferdinand C ; Eze, Sabinus ; Anyadiegwu, Clement.
Journal of the Science of Food and Agriculture.  82 (2002)  8 - p. 899-903 , 2002
Link: https://doi.org/10.1002/..
 
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