Ashizawa, Toranosuke
11  Ergebnisse:
Personensuche X
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1

Effect of pad groove width on slurry mean residence time an..:

Mu, Yan ; Zhuang, Yun ; Sampurno, Yasa...
Microelectronic Engineering.  157 (2016)  - p. 60-63 , 2016
 
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2

Effect of pad surface micro-texture on dishing and erosion ..:

Liao, Xiaoyan ; Zhuang, Yun ; Borucki, Leonard J....
Japanese Journal of Applied Physics.  53 (2014)  8 - p. 086501 , 2014
 
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3

Chemical Mechanical Polishing with Nanocolloidal Ceria Slur..:

Ryuzaki, Daisuke ; Hoshi, Yosuke ; Machii, Yoichi...
Japanese Journal of Applied Physics.  51 (2012)  3R - p. 036502 , 2012
 
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4

Chemical Mechanical Polishing with Nanocolloidal Ceria Slur..:

Ryuzaki, Daisuke ; Hoshi, Yosuke ; Machii, Yoichi...
Japanese Journal of Applied Physics.  51 (2012)  3R - p. 036502 , 2012
 
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5

Effect of Pad Surface Micro-Texture on Removal Rate during ..:

Liao, Xiaoyan ; Zhuang, Yun ; Borucki, Leonard J....
Japanese Journal of Applied Physics.  52 (2012)  1R - p. 018001 , 2012
 
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8

Effect of Cerium Oxide Particle Sizes in Oxide Chemical Mec..:

Sampurno, Yasa ; Sudargho, Fransisca ; Zhuang, Yun...
Electrochemical and Solid-State Letters.  12 (2009)  6 - p. H191 , 2009
 
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10

Effect of Pad Surface Roughness on SiO2 Removal Rate in Che..:

Yoshida, Masato ; Ono, Hiroshi ; Nishiyama, Masaya..
Japanese Journal of Applied Physics.  45 (2006)  2R - p. 733 , 2006
 
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