E-LIB Suche - Ergebnisse für: Barnett, Joel

1

Incorporating Texture Features into Optical Flow for Atmosp..:

, In: IGARSS 2023 - 2023 IEEE International Geoscience and Remote Sensing Symposium,

Barnett, Joel ; Bertozzi, Andrea ; Vese, Luminita. - p. 3784-3787 , 2023

2

III-V on Si Materials Surface Preparation and Process Contr..:

Vert, Alexey ; Satyavolu, PapaRao ; Fujita, Akira..
ECS Journal of Solid State Science and Technology. 5 (2015) 2 - p. P112-P116 , 2015

Link: https://doi.org/10.1149/..

3

Preface:

Barnett, Joel
Microelectronic Engineering. 102 (2013) - p. 67 , 2013

Link: https://doi.org/10.1016/..

4

Study of piezoresistance under unixial stress for technolog..:

Nainani, Aneesh ; Yum, Jung ; Barnett, Joel...
Applied Physics Letters. 96 (2010) 24 - p. , 2010

Link: https://doi.org/10.1063/..

5

SEMATECH Surface Preparation and Cleaning Conference:

Barnett, Joel
Microelectronic Engineering. 86 (2009) 2 - p. 121 , 2009

Link: https://doi.org/10.1016/..

6

Chemical analysis of HfO2∕Si (100) film systems exposed to ..:

Lysaght, Patrick S. ; Barnett, Joel ; Bersuker, Gennadi I....
Journal of Applied Physics. 101 (2007) 2 - p. , 2007

Link: https://doi.org/10.1063/..

7

The Influence of NH3 Anneal on the Crystallization Kinetics..:

Lysaght, Patrick ; Barnett, Joel ; Woicik, Joseph C....
ECS Transactions. 1 (2006) 5 - p. 313-322 , 2006

Link: https://doi.org/10.1149/..

8

Performance of HfO2∕TiN gate stacks with in situ grown and ..:

Park, Chang Seo ; Moumen, Naim ; Sim, Jang Hoan...
Applied Physics Letters. 87 (2005) 25 - p. , 2005

Link: https://doi.org/10.1063/..

9

Improvement in bias instabilities of Hf-silicate by dilute ..:

Akbar, Mohammad S. ; Moumen, Naim ; Barnett, Joel..
Applied Physics Letters. 87 (2005) 25 - p. , 2005

Link: https://doi.org/10.1063/..

10

Integration of Dual Metal Gate CMOS on High-k Dielectrics U..:

Zhang, Zhibo ; Song, S. C. ; Huffman, Craig...
Electrochemical and Solid-State Letters. 8 (2005) 10 - p. G271 , 2005

Link: https://doi.org/10.1149/..

11

Effect of NH3 surface nitridation temperature on mobility o..:

Akbar, Mohammad S. ; Moumen, Naim ; Barnett, Joel..
Applied Physics Letters. 86 (2005) 3 - p. , 2005

Link: https://doi.org/10.1063/..

12

Metal Wet Etch Process Development for Dual Metal Gate CMOS:

Hussain, Muhammad Mustafa ; Moumen, Naim ; Barnett, Joel...
Electrochemical and Solid-State Letters. 8 (2005) 12 - p. G333 , 2005

Link: https://doi.org/10.1149/..

13

Probing stress effects in HfO2 gate stacks with time depend..:

Young, Chadwin D. ; Bersuker, Gennadi ; Zhao, Yuegang...
Microelectronics Reliability. 45 (2005) 5-6 - p. 806-810 , 2005

Link: https://doi.org/10.1016/..

14

Characterization of advanced gate stacks for Si CMOS by ele..:

Foran, Brendan ; Barnett, Joel ; Lysaght, Patrick S...
Journal of Electron Spectroscopy and Related Phenomena. 143 (2005) 2-3 - p. 149-158 , 2005

Link: https://doi.org/10.1016/..

15

Characterization of Ultra-Thin Hf-based Alternative Dielect..:

Agustin, Melody P ; Foran, Brendan ; Bersuker, Gennadi..
Microscopy and Microanalysis. 10 (2004) S02 - p. 322-323 , 2004

Link: https://doi.org/10.1017/..