Breternitz, Volkmar
6  Ergebnisse:
Personensuche X
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1

Recalibration-free measurement of the compound layer thickn..:

, In: Information technology and electrical engineering - devices and systems, materials and technologies for the future / Faculty of Electrical and Information Technology, [Technische Universität Ilmenau. Hrsg.: Peter Scharff]
Wilke, Marcus ; Analytis, Minas ; Breternitz, Volkmar... (2006)  - p. 319-320
Exemplar:  Zentrale:Magazin 01.R.9827
 
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2

Zinc oxide - unique material for micro-/nanotechnology:

, In: Information technology and electrical engineering - devices and systems, materials and technologies for the future / Faculty of Electrical and Information Technology, [Technische Universität Ilmenau. Hrsg.: Peter Scharff]
Flickyngerova, Sona ; Novotny, Ivan ; Tvarozek, Vladimir.... (2006)  - p. 309-310
Exemplar:  Zentrale:Magazin 01.R.9827
 
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3

Silicon wafer residual stresses determination by evaluating..:

, In: [Vortragsreihen
Vaněk, Oldrich ; Hučko, B. ; Držik, M... (1999)  - p. 404-408
Exemplar:  Zentrale:Magazin 01.h.1069-2
 
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4

Thin film microelectrode arrays for electrochemical biosens..:

, In: [Vortragsreihen
Novotny, I. ; Breternitz, Volkmar ; Ivanic, R..... (1999)  - p. 215-220
Exemplar:  Zentrale:Magazin 01.h.1069-1
 
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5

Zinc oxide - Unique material for micro- /nanotechnology:

Flickyngerova, Sona ; Novotny, Ivan ; Tvarozek, Vladimir...
Information technology and electrical engineering - devices and systems, materials and technologies for the future -- 51. IWK, Internationales Wissenschaftliches Kolloquium.  , 2009
 
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6

Recalibration-free measurement of the compound layer thickn..:

Wilke, Marcus ; Analytis, Minas ; Breternitz, Volkmar..
Information technology and electrical engineering - devices and systems, materials and technologies for the future -- 51. IWK, Internationales Wissenschaftliches Kolloquium.  , 2009
 
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