E-LIB Suche - Ergebnisse für: Byun, Jeong Soo

1

Characterization of Low-Temperature Stress Hump in Relation..:

Hong, Jeong Eui ; Byun, Jeong Soo ; Kim, Sun Il.
Japanese Journal of Applied Physics. 44 (2005) 1R - p. 145 , 2005

2

Nickel silicides in semiconductor processing: thermal budge..:

Ramamurthy, Sundar ; Ramachandran, Balasubramanian ; Byun, Jeong Soo...
Materials Science and Engineering: B. 114-115 (2004) - p. 46-50 , 2004

Link: https://doi.org/10.1016/..

3

In situ barrier formation using rapid thermal annealing of ..:

Lee, Byung Hak ; Lee, Kee Sun ; Sohn, Dong Kyun...
Applied Physics Letters. 76 (2000) 18 - p. 2538-2540 , 2000

Link: https://doi.org/10.1063/..

4

Degradation of Reactively Sputtered Ti‐Si‐N Films Used as a..:

Park, Ji‐Soo ; Sohn, Dong Kyun ; Lee, Byung Hak...
Journal of The Electrochemical Society. 146 (1999) 4 - p. 1579-1582 , 1999

Link: https://doi.org/10.1149/..

5

Reduction of Dichlorosiliane‐Based Tungsten Silicide Resist..:

Byun, Jeong Soo ; Lee, Byung Hak ; Park, Ji‐Soo...
Journal of The Electrochemical Society. 146 (1999) 6 - p. 2261-2269 , 1999

Link: https://doi.org/10.1149/..

6

Formation of High Conductivity WSi x Layer and its Characte..:

Byun, Jeong Soo ; Lee, Byung Hak ; Park, Ji‐Soo...
Journal of The Electrochemical Society. 145 (1998) 9 - p. 3228-3235 , 1998

Link: https://doi.org/10.1149/..

7

Formation of epitaxial CoSi2 spike in Co/Si3N4/Si(100) syst..:

Park, Ji-Soo ; Sohn, Dong Kyun ; Kim, Yeongcheol...
Applied Physics Letters. 73 (1998) 16 - p. 2284-2286 , 1998

Link: https://doi.org/10.1063/..

8

Selective Titanium Silicide Deposition Using SiH4 ‐ TiCl4 ‐..:

Byun, Jeong Soo ; Choi, Sang Jun ; Kim, Jae Jeong...
Journal of The Electrochemical Society. 145 (1998) 11 - p. 3941-3950 , 1998

Link: https://doi.org/10.1149/..

9

Formation of CoTi barrier and increased thermal stability o..:

Sohn, Dong Kyun ; Park, Ji-Soo ; Lee, Byung Hak...
Applied Physics Letters. 73 (1998) 16 - p. 2302-2304 , 1998

Link: https://doi.org/10.1063/..

10

Dopant Effects on Lateral Silicide Growth in Self‐Aligned T..:

Park, Ji‐Soo ; Byun, Jeong Soo ; Sohn, Dong Kyun...
Journal of The Electrochemical Society. 145 (1998) 10 - p. 3585-3589 , 1998

Link: https://doi.org/10.1149/..

11

The effects of screen oxide and low temperature BPSG anneal..:

Lee, Kye-Nam ; Ahn, Jae-Gyung ; Hwang, Hyunsang..
Thin Solid Films. 308-309 (1997) - p. 585-588 , 1997

Link: https://doi.org/10.1016/..

12

Effect of Deposition Temperature and Sputtering Ambient on ..:

Byun, Jeong Soo ; Park, Ji‐Soo ; Kim, Jae Jeong
Journal of The Electrochemical Society. 144 (1997) 9 - p. 3175-3179 , 1997

Link: https://doi.org/10.1149/..

13

Characterization of the Dopant Effect on Dichlorosilane‐Bas..:

Byun, Jeong Soo ; Lee, Byung Hak ; Park, Ji‐Soo.
Journal of The Electrochemical Society. 144 (1997) 10 - p. 3572-3582 , 1997

Link: https://doi.org/10.1149/..

14

Effect of channeling of halo ion implantation on threshold ..:

Hwang, Hyunsang ; Lee, Dong Hoon ; Ahn, Jae-Gyung..
Applied Physics Letters. 68 (1996) 7 - p. 938-939 , 1996

Link: https://doi.org/10.1063/..

15

W as a Bit Line Interconnection in Capacitor-Over-Bit-line ..:

Byun, Jeong Soo ; Kim, Jun Ki ; Jin Won Park, Jin Won Park.
Japanese Journal of Applied Physics. 35 (1996) 2S - p. 1086 , 1996

Link: https://doi.org/10.1143/..