E-LIB Suche - Ergebnisse für: Current, Michael I.

1

Effects of Ion Channeling and Co-Implants on Ion Ranges and..:

Current, Michael I. ; Sakaguchi, Takuya ; Kawasaki, Yoji...
IEEE Journal of the Electron Devices Society. 12 (2024) - p. 399-406 , 2024

Link: https://doi.org/10.1109/..

2

Effects of Ion Channeling and Co-implants on Ion Ranges and..:

, In: 2023 21st International Workshop on Junction Technology (IWJT),

Current, Michael I. ; Sakaguchi, Takuya ; Kawasaki, Yoji... - p. 1-6 , 2023

Link: https://doi.org/10.23919..

3

Corrections to "Susceptor Coupling for the Uniformity and D..:

Lee, Yao-Jen ; Hsueh, Fu-Kuo ; Current, Michael I...
IEEE Electron Device Letters. 44 (2023) 6 - p. 1015-1015 , 2023

Link: https://doi.org/10.1109/..

4

Ion erosion and elemental purity of deposited Si films on A:

Wriggins, Walt ; Wong, Matthew ; Green, Avery..
MRS Advances. 7 (2023) 36 - p. 1441-1444 , 2023

Link: https://doi.org/10.1557/..

5

Profiles and defects in highly channeled and random beam or..:

Current, Michael I. ; Kawasaki, Yoji ; Sakaguchi, Takuya..
MRS Advances. 7 (2023) 36 - p. 1454-1458 , 2023

Link: https://doi.org/10.1557/..

6

Corrections to "Low-Temperature Microwave Annealing Process..:

Lee, Yao-Jen ; Cho, Ta-Chun ; Chuang, Shang-Shiun...
IEEE Transactions on Electron Devices. 70 (2023) 7 - p. 3983-3983 , 2023

Link: https://doi.org/10.1109/..

7

Particle counts and size distributions after implantation w..:

Current, Michael I. ; Fujibuchi, Hideto ; Ido, Takahiko.
MRS Advances. 7 (2022) 36 - p. 1253-1256 , 2022

Link: https://doi.org/10.1557/..

8

Ion erosion and particle release in fine graphite:

Current, Michael I. ; Fujibuchi, Hideto ; Ido, Takahiko..
MRS Advances. 7 (2022) 36 - p. 1450-1453 , 2022

Link: https://doi.org/10.1557/..

9

Angle-directed ion beams for localized deposition on high a..:

Seidel, Thomas E. ; Current, Michael I.
MRS Advances. 7 (2022) 36 - p. 1445-1449 , 2022

Link: https://doi.org/10.1557/..

10

Ultra-Shallow Junction Formation by Monolayer Doping Proces..:

Chuang, Shang-Shiun ; Cho, Ta-Chun ; Sung, Po-Jung...
ECS Journal of Solid State Science and Technology. 6 (2017) 5 - p. P350-P355 , 2017

Link: https://doi.org/10.1149/..

11

Ion implantation of advanced silicon devices: Past, present..:

Current, Michael I.
Materials Science in Semiconductor Processing. 62 (2017) - p. 13-22 , 2017

Link: https://doi.org/10.1016/..

12

Low-Temperature Microwave Annealing Processes for Future IC..:

Lee, Yao-Jen ; Cho, Ta-Chun ; Chuang, Shang-Shiun...
IEEE Transactions on Electron Devices. 61 (2014) 3 - p. 651-665 , 2014

Link: https://doi.org/10.1109/..

13

Microwave Annealing of Phosphorus and Cluster Carbon Implan..:

Cho, Ta-Chun ; Lu, Yu-Lun ; Yao, Jie-Yi...
ECS Journal of Solid State Science and Technology. 2 (2013) 7 - p. P293-P298 , 2013

Link: https://doi.org/10.1149/..

14

Susceptor Coupling for the Uniformity and Dopant Activation..:

Lee, Yao-Jen ; Hsueh, Fu-Kuo ; Current, Michael I...
IEEE Electron Device Letters. 33 (2012) 2 - p. 248-250 , 2012

Link: https://doi.org/10.1109/..

15

High-Resolution Junction Photo-Voltage Mapping of Sheet Res..:

Faifer, Vladimir ; Current, Michael I. ; Ohno, Naotsugu..
ECS Transactions. 13 (2008) 1 - p. 37-43 , 2008

Link: https://doi.org/10.1149/..