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X
Dammel, Ralph
49  Ergebnisse:
Personensuche X
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1

Freezing Materials For Double Patterning:

Lee, Dong-Kwan ; Cao, Yi ; Abdallah, David...
Journal of Photopolymer Science and Technology.  22 (2009)  5 - p. 653-661 , 2009
Link: https://doi.org/10.2494/..
 
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2

Novel Diamantane Polymer Platform for Resist Applications:

Padmanaban, Murirathna ; Chakrapani, Srinivasan ; Lin, Guanyang...
Journal of Photopolymer Science and Technology.  20 (2007)  5 - p. 719-728 , 2007
Link: https://doi.org/10.2494/..
 
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3

Recent Advances in the Design of Resist Materials for 157 n..:

Houlihan, Francis ; Sakamuri, Raj ; Romano, Andrew...
Journal of Photopolymer Science and Technology.  17 (2004)  4 - p. 621-630 , 2004
Link: https://doi.org/10.2494/..
 
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4

193 nm Immersion Lithography-Taking the Plunge:

Dammel, Ralph ; Houlihan, Frank M. ; Sakamuri, Raj..
Journal of Photopolymer Science and Technology.  17 (2004)  4 - p. 587-601 , 2004
Link: https://doi.org/10.2494/..
 
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5

Influence of ArF Resist Components and Process Conditions o..:

Padmanaban, Munirathna ; Anyadiegwu, Clement ; Kanda, Takashi...
Journal of Photopolymer Science and Technology.  16 (2003)  4 - p. 475-481 , 2003
Link: https://doi.org/10.2494/..
 
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6

Etch Properties of 193nm Resists: Issues and Approaches:

Padmanaban, Munirathna ; Alemy, Eric ; Dammel, Ralph...
Journal of Photopolymer Science and Technology.  15 (2002)  3 - p. 521-527 , 2002
Link: https://doi.org/10.2494/..
 
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7

Dissolution Inhibitors for 157 nm Lithography: A Progress R..:

Conley, Will ; Miller, Daniel ; Chambers, Charles...
Journal of Photopolymer Science and Technology.  15 (2002)  4 - p. 613-617 , 2002
Link: https://doi.org/10.2494/..
 
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8

Materials and Resists for 193 and 157nm Applications:

Padmanaban, Munirathna ; Alemy, Eric ; Bae, Jun-Bom...
Journal of Photopolymer Science and Technology.  14 (2001)  4 - p. 631-642 , 2001
Link: https://doi.org/10.2494/..
 
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9

t‐BOC blocked hydroxyphenyl‐methacrylates: On the way to qu..:

Przybilla, Klaus‐jürgen ; Dammel, Ralph ; Pawlowski, Georg..
Polymer Engineering & Science.  32 (1992)  20 - p. 1516-1522 , 1992
Link: https://doi.org/10.1002/..
 
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10

Novel photoacid generators: Key components for the progress..:

PAWLOWSKI, GEORG ; DAMMEL, RALPH ; PRZYBILLA, KLAUS-JÜRGEN..
Journal of Photopolymer Science and Technology.  4 (1991)  3 - p. 389-402 , 1991
Link: https://doi.org/10.2494/..
 
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11

New t-BOC blocked polymers for advanced lithographic applic..:

PRZYBILLA, KLAUS-JÜRGEN ; DAMMEL, RALPH ; RÖSCHERT, HORST..
Journal of Photopolymer Science and Technology.  4 (1991)  3 - p. 421-432 , 1991
Link: https://doi.org/10.2494/..
 
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12

Substituted polyhydroxystyrenes as matrix resins for chemic..:

Pawlowski, Georg ; Dammel, Ralph ; Eckes, Charlotte...
Microelectronic Engineering.  13 (1991)  1-4 - p. 29-32 , 1991
Link: https://doi.org/10.1016/..
 
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13

Gasphasen-Reaktionen, 71PE-Spektren und Pyrolysen stickstof..:

Bock, Hans ; Dammel, Ralph
Zeitschrift für Naturforschung B.  45 (1990)  1 - p. 59-71 , 1990
Link: https://doi.org/10.1515/..
 
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14

Percolation theory and resist development in x-ray lithogra..:

Oertel, Heinrich K. ; Weiss, Manfred ; Dammel, Ralph.
Microelectronic Engineering.  11 (1990)  1-4 - p. 267-270 , 1990
Link: https://doi.org/10.1016/..
 
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15

A novel two component positive photoresist for deep UV lith..:

Pawlowski, Georg ; Dammel, Ralph ; Lindley, Charlet R....
Microelectronic Engineering.  11 (1990)  1-4 - p. 491-495 , 1990
Link: https://doi.org/10.1016/..
 
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