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Downey, Daniel F.
709  Ergebnisse:
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1

The local structural characterization of the inactive clust..:

Sahiner, M. Alper ; Downey, Daniel F. ; Novak, Steven W...
Microelectronics Journal.  36 (2005)  3-6 - p. 522-526 , 2005
Link: https://doi.org/10.1016/..
 
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2

Tuning for optimal performance in angle control, uniformity..:

Liebert, Reuel B. ; Olson, Joseph C. ; Arevalo, Edwin A..
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms.  237 (2005)  1-2 - p. 365-371 , 2005
Link: https://doi.org/10.1016/..
 
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3

Ultra-shallow junctions produced by plasma doping and flash..:

Skorupa, Wolfgang ; Yankov, Rossen A. ; Anwand, Wolfgang...
Materials Science and Engineering: B.  114-115 (2004)  - p. 358-361 , 2004
Link: https://doi.org/10.1016/..
 
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4

Effects of "fast" rapid thermal anneals on sub-keV boron an..:

Downey, Daniel F. ; Falk, Scott W. ; Bertuch, Adam F..
Journal of Electronic Materials.  28 (1999)  12 - p. 1340-1344 , 1999
Link: https://doi.org/10.1007/..
 
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5

Foreword:

Ravindra, N. M. ; Downey, Daniel F. ; Marcus, Steven D..
Journal of Electronic Materials.  28 (1999)  12 - p. 1327-1327 , 1999
Link: https://doi.org/10.1007/..
 
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6

RTP requirements to yield uniform and repeatable ultra-shal..:

Marcus, Steven ; Lerch, Wilfried ; Downey, Daniel F...
Journal of Electronic Materials.  27 (1998)  12 - p. 1291-1295 , 1998
Link: https://doi.org/10.1007/..
 
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7

Effect of fluorine on the diffusion of boron in ion implant..:

Downey, Daniel F. ; Chow, Judy W. ; Ishida, Emi.
Applied Physics Letters.  73 (1998)  9 - p. 1263-1265 , 1998
Link: https://doi.org/10.1063/..
 
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8

Optimization of RTA parameters to produce ultra-shallow, hi..:

Downey, Daniel F. ; Marcus, Steven D. ; Chow, Judy W.
Journal of Electronic Materials.  27 (1998)  12 - p. 1296-1314 , 1998
Link: https://doi.org/10.1007/..
 
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9

Dose-rate effects on the formation of ultra-shallow junctio..:

Downey, Daniel F ; Osburn, Carlton M ; Cummings, James J..
Thin Solid Films.  308-309 (1997)  - p. 562-569 , 1997
Link: https://doi.org/10.1016/..
 
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10

Metals contamination in high and medium current implanters:

Downey, Daniel F. ; Angel, G.C.
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms.  96 (1995)  1-2 - p. 68-74 , 1995
Link: https://doi.org/10.1016/..
 
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11

Low energy ion implantation and its characterization and pr..:

Downey, Daniel F. ; Eddy, Ronald J. ; Mehta, Sandeep
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms.  74 (1993)  1-2 - p. 160-169 , 1993
Link: https://doi.org/10.1016/..
 
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12

Editorial:

Downey, Daniel F. ; Farley, Marvin
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms.  74 (1993)  1-2 - p. vii-viii , 1993
Link: https://doi.org/10.1016/..
 
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13

Control of BF2 dissociation in high-current ion implantatio:

Downey, Daniel F. ; Liebert, Reuel B.
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms.  55 (1991)  1-4 - p. 49-54 , 1991
Link: https://doi.org/10.1016/..
 
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14

Control of metal contamination in the Varian Extrion 1000 i..:

Liebert, Reuel B. ; Satoh, Shu ; Pedersen, Bjorn O....
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms.  55 (1991)  1-4 - p. 71-76 , 1991
Link: https://doi.org/10.1016/..
 
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15

Control of wafer charging on the Varian EXTRION 1000 ion im..:

Satoh, Shu ; Pedersen, Bjorn O. ; Downey, Daniel F....
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms.  55 (1991)  1-4 - p. 77-81 , 1991
Link: https://doi.org/10.1016/..
 
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