E-LIB Suche - Ergebnisse für: El Kodadi, M.

1

Symmetrical azine ligand-based evaluation of their catechol..:

El Arkoubi, I. ; Bouammali, H. ; El Kodadi, M....
Materials Today: Proceedings. 72 (2023) - p. 3463-3470 , 2023

Link: https://doi.org/10.1016/..

2

Synthesis, Molecular Docking, MEP and SAR Analysis, ADME-To..:

Kaddouri, Y. ; Bouchal, B. ; Abrigach, F....
Journal of Chemistry. 2021 (2021) - p. 1-11 , 2021

Link: https://doi.org/10.1155/..

3

Study of the catecholase catalytic properties of copper (II..:

Titi, A. ; Al-Noaimi, M. ; Kaddouri, Y....
Materials Today: Proceedings. 13 (2019) - p. 1134-1142 , 2019

Link: https://doi.org/10.1016/..

4

Catechol oxidase and Copper(I/II) Complexes Derived from Bi..:

El Ati, R. ; Takfaoui, A. ; El Kodadi, M....
Materials Today: Proceedings. 13 (2019) - p. 1229-1237 , 2019

Link: https://doi.org/10.1016/..

5

Pyrazole Compounds : Synthesis, molecular structure, chemic..:

Kaddouri, Y. ; Abrigach, F. ; Mechbal, N....
Materials Today: Proceedings. 13 (2019) - p. 956-963 , 2019

Link: https://doi.org/10.1016/..

6

Application of scatterometric porosimetry to characterize p..:

Licitra, C. ; Bouyssou, R. ; El Kodadi, M....
Thin Solid Films. 519 (2011) 9 - p. 2825-2829 , 2011

Link: https://doi.org/10.1016/..

7

Resist trimming etch process control using dynamic scattero..:

El kodadi, M. ; Soulan, S. ; Besacier, M..
Microelectronic Engineering. 86 (2009) 4-6 - p. 1040-1042 , 2009

Link: https://doi.org/10.1016/..

8

Inhibition effect of two organic compounds pyridine–pyrazol..:

Tebbji, K. ; Oudda, H. ; Hammouti, B....
Colloids and Surfaces A: Physicochemical and Engineering Aspects. 259 (2005) 1-3 - p. 143-149 , 2005

Link: https://doi.org/10.1016/..

9

Inhibitive action of two bipyrazolic isomers towards corros..:

Tebbji, K. ; Oudda, H. ; Hammouti, B....
Applied Surface Science. 241 (2005) 3-4 - p. 326-334 , 2005

Link: https://doi.org/10.1016/..

10

Characterisation of a new tripyrazole derivative as inhibit..:

Elayyachy, M. ; El Kodadi, M. ; Hammouti, B...
Pigment & Resin Technology. 33 (2004) 6 - p. 375-379 , 2004

Link: https://doi.org/10.1108/..

11

Etching Process Scalability and Challenges for ULK Material:

Chevolleau, T ; Posseme, N ; David, T...
info:eu-repo/semantics/altIdentifier/doi/10.1109/IITC.2010.5510735. , 2010

Link: https://hal.science/hal-..

12

Etching Process Scalability and Challenges for ULK Material:

Chevolleau, T ; Posseme, N ; David, T...
info:eu-repo/semantics/altIdentifier/doi/10.1109/IITC.2010.5510735. , 2010

Link: https://hal.science/hal-..

13

Real time scatterometry for profile control during resist t..:

El Kodadi, M ; Soulan, S ; Besacier, M.
info:eu-repo/semantics/altIdentifier/doi/10.1116/1.3256594. , 2009

Link: https://hal.science/hal-..

14

Real time scatterometry for profile control during resist t..:

El Kodadi, M ; Soulan, S ; Besacier, M.
info:eu-repo/semantics/altIdentifier/doi/10.1116/1.3256594. , 2009

Link: https://hal.science/hal-..

15

Real time scatterometry for profile control during resist t..:

El Kodadi, M ; Soulan, S ; Besacier, M.
info:eu-repo/semantics/altIdentifier/doi/10.1116/1.3256594. , 2009

Link: https://hal.archives-ouv..