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Félix, Nelson
1411  Ergebnisse:
Personensuche X
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1

Epi Source-Drain Damage Mitigation During Channel Release o..:

Durfee, Curtis ; Otto IV, Ivo ; Kal, Subhadeep...
ECS Transactions.  112 (2023)  1 - p. 45-52 , 2023
Link: https://doi.org/10.1149/..
 
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2

Evaluation of (110) versus (001) Channel Orientation for Im..:

, In: 2023 International Electron Devices Meeting (IEDM),
Mochizuki, Shogo ; Loubet, Nicolas ; Mirdha, Pial... - p. 1-4 , 2023
Link: https://doi.org/10.1109/..
 
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3

Advanced BEOL Materials, Processes, and Integration to Redu..:

, In: 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits),
Nogami, Takeshi ; Gluschenkov, Oleg ; Sulehria, Yasir... - p. 423-424 , 2022
Link: https://doi.org/10.1109/..
 
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4

Development of Gastronomic Strategies for the Application a..:

, In: Food Engineering Series; Sustainable Innovation in Food Product Design,
Silva, Ana T. ; Morgado, Cátia ; Félix, Nelson... - p. 87-103 , 2021
Link: https://doi.org/10.1007/..
 
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5

Effect of Rocha Pear Peel Extracts Added to Wheat and Rye B..:

, In: INCREaSE 2019,
Morgado, Cátia ; Bernardo, Patrícia ; Henriques, Inês... - p. 184-197 , 2019
Link: https://doi.org/10.1007/..
 
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6

O trabalho é como um buraco negro: você fica olhando para e..:

Felix, Nelson
arte e ensaios.  , 2017
Link: https://doi.org/10.37235..
 
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7

Acid-Labile, Chain-Scission Polymer Systems Used as Positiv..:

Felix, Nelson ; Ober, Christopher K.
Chemistry of Materials.  20 (2008)  9 - p. 2932-2936 , 2008
Link: https://doi.org/10.1021/..
 
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8

Molecular Glass Resists for High-Resolution Patterning:

Dai, Junyan ; Chang, Seung Wook ; Hamad, Alyssandrea...
Chemistry of Materials.  18 (2006)  15 - p. 3404-3411 , 2006
Link: https://doi.org/10.1021/..
 
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9

New PFOS Free Photoresist Systems for EUV Lithography:

Ayothi, Ramakrishnan ; Chang, Seung Wook ; Felix, Nelson...
Journal of Photopolymer Science and Technology.  19 (2006)  4 - p. 515-520 , 2006
Link: https://doi.org/10.2494/..
 
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10

Patterning Material Challenges for Improving EUV Stochastic:

Silva, Anuja De ; Meli, Luciana ; Guo, Jing...
Journal of Photopolymer Science and Technology.  32 (2019)  1 - p. 169-177 , 2019
Link: https://doi.org/10.2494/..
 
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11

Fluorinated Quaternary Ammonium Salts as Dissolution Aids f..:

Tanaka, Manabu ; Rastogi, Abhinav ; Toepperwein, Gregory N....
Chemistry of Materials.  21 (2009)  14 - p. 3125-3135 , 2009
Link: https://doi.org/10.1021/..
 
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12

Solid state NMR investigation of photoresist molecular glas..:

VanderHart, David L. ; Prabhu, Vivek M. ; De Silva, Anuja..
Journal of Materials Chemistry.  19 (2009)  18 - p. 2683 , 2009
Link: https://doi.org/10.1039/..
 
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13

Towards environmentally friendly, dry deposited, water deve..:

Pfeiffer, Frauke ; Felix, Nelson M. ; Neuber, Christian..
Phys. Chem. Chem. Phys..  10 (2008)  9 - p. 1257-1262 , 2008
Link: https://doi.org/10.1039/..
 
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14

Study of the Structure−Properties Relationship of Phenolic ..:

De Silva, Anuja ; Lee, Jin-Kyun ; André, Xavier...
Chemistry of Materials.  20 (2008)  4 - p. 1606-1613 , 2008
Link: https://doi.org/10.1021/..
 
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15

Supercritical Carbon Dioxide Compatible Salts: Synthesis an..:

Tanaka, Manabu ; Rastogi, Abhinav ; Felix, Nelson M..
Journal of Photopolymer Science and Technology.  21 (2008)  3 - p. 393-396 , 2008
Link: https://doi.org/10.2494/..
 
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