E-LIB Suche - Ergebnisse für: Fallica, Roberto

1

Mean Free Path of Electrons in Organic Photoresists for Ext..:

Fallica, Roberto ; Mahne, Nicola ; Conard, Thierry...
ACS Applied Materials & Interfaces. 15 (2023) 29 - p. 35483-35494 , 2023

Link: https://doi.org/10.1021/..

2

Evolution of Secondary Electrons Emission During EUV Exposu..:

Fallica, Roberto ; Nannarone, Stefano ; Mahne, Nicola...
Journal of Photopolymer Science and Technology. 34 (2021) 1 - p. 99-103 , 2021

Link: https://doi.org/10.2494/..

3

Correction: Effect of molecular weight on the EUV-printabil..:

Rathore, Ashish ; Pollentier, Ivan ; Singh, Harpreet...
Journal of Materials Chemistry C. 8 (2020) 17 - p. 5967-5967 , 2020

Link: https://doi.org/10.1039/..

4

Effect of molecular weight on the EUV-printability of main ..:

Rathore, Ashish ; Pollentier, Ivan ; Singh, Harpreet...
Journal of Materials Chemistry C. 8 (2020) 17 - p. 5958-5966 , 2020

Link: https://doi.org/10.1039/..

5

Nanolithographic Top‐Down Patterning of Polyoxovanadate‐Bas..:

Rösner, Benedikt ; Fallica, Roberto ; Johnson, Manuel...
ChemNanoMat. 6 (2020) 11 - p. 1620-1624 , 2020

Link: https://doi.org/10.1002/..

6

Sensitizer for EUV Chemically Amplified Resist: Metal versu..:

Jiang, Jing ; Giordano, Gaetano ; Fallica, Roberto..
Journal of Photopolymer Science and Technology. 32 (2019) 1 - p. 21-25 , 2019

Link: https://doi.org/10.2494/..

7

Photoacid generator–polymer interaction on the quantum yiel..:

Fallica, Roberto ; Ekinci, Yasin
Journal of Materials Chemistry C. 6 (2018) 27 - p. 7267-7273 , 2018

Link: https://doi.org/10.1039/..

8

High-resolution grayscale patterning using extreme ultravio..:

Fallica, Roberto ; Kirchner, Robert ; Schift, Helmut.
Microelectronic Engineering. 177 (2017) - p. 1-5 , 2017

Link: https://doi.org/10.1016/..

9

Selective Surface Smoothening of Polymer Microlenses by Dep..:

Chidambaram, Nachiappan ; Kirchner, Robert ; Fallica, Roberto...
Advanced Materials Technologies. 2 (2017) 5 - p. , 2017

Link: https://doi.org/10.1002/..

10

SnOx high-efficiency EUV interference lithography gratings ..:

Buitrago, Elizabeth ; Fallica, Roberto ; Fan, Daniel...
Microelectronic Engineering. 155 (2016) - p. 44-49 , 2016

Link: https://doi.org/10.1016/..

11

A Novel Sb2Te3 Polymorph Stable at the Nanoscale:

Rotunno, Enzo ; Longo, Massimo ; Wiemer, Claudia...
Chemistry of Materials. 27 (2015) 12 - p. 4368-4373 , 2015

Link: https://doi.org/10.1021/..

12

Effect of a thin Ti interfacial layer on the thermal resist..:

Battaglia, Jean-Luc ; Kusiak, Andrzej ; Saci, Abdelhak...
Applied Physics Letters. 105 (2014) 12 - p. , 2014

Link: https://doi.org/10.1063/..

13

Thermal conductivity measurement of a Sb2Te3 phase change n..:

Saci, Abdelhak ; Battaglia, Jean-Luc ; Kusiak, Andrzej..
Applied Physics Letters. 104 (2014) 26 - p. , 2014

Link: https://doi.org/10.1063/..

14

Thermal properties of In–Sb–Te films and interfaces for pha..:

Fallica, Roberto ; Wiemer, Claudia ; Stoycheva, Toni...
Microelectronic Engineering. 120 (2014) - p. 3-8 , 2014

Link: https://doi.org/10.1016/..

15

Structural and electrical analysis of In–Sb–Te‐based PCM ce..:

Fallica, Roberto ; Stoycheva, Toni ; Wiemer, Claudia.
physica status solidi (RRL) – Rapid Research Letters. 7 (2013) 11 - p. 1009-1013 , 2013

Link: https://doi.org/10.1002/..