E-LIB Suche - Ergebnisse für: Feigl, F.

1

Positive charge generation in metal-oxide-semiconductor cap..:

Trombetta, L. P. ; Feigl, F. J. ; Zeto, R. J.
Journal of Applied Physics. 69 (1991) 4 - p. 2512-2521 , 1991

Link: https://doi.org/10.1063/..

2

Rechargeable E′ centers in sputter-deposited silicon dioxid..:

Zvanut, M. E. ; Feigl, F. J. ; Fowler, W. B....
Applied Physics Letters. 54 (1989) 21 - p. 2118-2120 , 1989

Link: https://doi.org/10.1063/..

3

A defect relaxation model for bias instabilities in metal-o..:

Zvanut, M. E. ; Feigl, F. J. ; Zook, J. D.
Journal of Applied Physics. 64 (1988) 4 - p. 2221-2223 , 1988

Link: https://doi.org/10.1063/..

4

Analysis of the feedback voltage during constant current av..:

Trombetta, L. P. ; Zeto, R. J. ; Feigl, F. J.
Journal of Applied Physics. 62 (1987) 5 - p. 1913-1919 , 1987

Link: https://doi.org/10.1063/..

5

The Distribution of Cl Impurities in SiO2 Films Produced by..:

Sheu, Y. ‐D. ; Butler, S. R. ; Feigl, F. J..
Journal of The Electrochemical Society. 133 (1986) 10 - p. 2136-2140 , 1986

Link: https://doi.org/10.1149/..

6

Electrical properties of silicon dioxide films fabricated a..:

Vogel, R. H. ; Butler, S. R. ; Feigl, F. J.
Journal of Electronic Materials. 14 (1985) 3 - p. 329-342 , 1985

Link: https://doi.org/10.1007/..

7

Electrical properties of silicon dioxide films fabricated a..:

Zvanut, M. E. ; Feigl, F. J. ; Butler, S. R..
Journal of Electronic Materials. 14 (1985) 3 - p. 343-366 , 1985

Link: https://doi.org/10.1007/..

8

Electrical Properties of Silicon Dioxide Films Fabricated a..:

Trombetta, L. P. ; Zeto, R. J. ; Feigl, F. J..
Journal of The Electrochemical Society. 132 (1985) 11 - p. 2706-2713 , 1985

Link: https://doi.org/10.1149/..

9

Current-induced hydrogen migration and interface trap gener..:

Feigl, F.J. ; Gale, R. ; Chew, H...
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 1 (1984) 2-3 - p. 348-354 , 1984

Link: https://doi.org/10.1016/..

10

Hydrogen migration under avalanche injection of electrons i..:

Gale, R. ; Feigl, F. J. ; Magee, C. W..
Journal of Applied Physics. 54 (1983) 12 - p. 6938-6942 , 1983

Link: https://doi.org/10.1063/..

11

The effects of water on oxide and interface trapped charge ..:

Feigl, F. J. ; Young, D. R. ; DiMaria, D. J...
Journal of Applied Physics. 52 (1981) 9 - p. 5665-5682 , 1981

Link: https://doi.org/10.1063/..

12

Reduction of electron trapping in silicon dioxide by high-t..:

Lai, S. K. ; Young, D. R. ; Calise, J. A..
Journal of Applied Physics. 52 (1981) 9 - p. 5691-5695 , 1981

Link: https://doi.org/10.1063/..

13

Mobile Sodium Ion Passivation in HCl Oxides:

Rohatgi, A. ; Butler, S. R. ; Feigl, F. J.
Journal of The Electrochemical Society. 126 (1979) 1 - p. 149-154 , 1979

Link: https://doi.org/10.1149/..

14

Chlorine Incorporation in HCl Oxides:

Rohatgi, A. ; Butler, S. R. ; Feigl, F. J...
Journal of The Electrochemical Society. 126 (1979) 1 - p. 143-149 , 1979

Link: https://doi.org/10.1149/..

15

Low-Temperature Photocurrent Spectroscopy on Localized Stat..:

Kapoor, V. J. ; Feigl, F. J. ; Butler, S. R.
Physical Review Letters. 39 (1977) 19 - p. 1219-1222 , 1977

Link: https://doi.org/10.1103/..