E-LIB Suche - Ergebnisse für: Fursenko, Oksana

1

Titanium Nitride Plasmonic Nanohole Arrays for CMOS-Compati..:

Reiter, Sebastian ; Han, Weijia ; Mai, Christian...
Plasmonics. 18 (2023) 3 - p. 831-843 , 2023

Link: https://doi.org/10.1007/..

2

Etch mechanism of an Al2O3 hard mask in the Bosch process:

Drost, Martin ; Marschmeyer, Steffen ; Fraschke, Mirko...
Micro and Nano Engineering. 14 (2022) - p. 100102 , 2022

Link: https://doi.org/10.1016/..

3

Determination of optical constants and scattering propertie..:

Bauer, Joachim ; Fursenko, Oksana ; Heinrich, Friedhelm...
Optical Materials Express. 12 (2021) 1 - p. 204 , 2021

Link: https://doi.org/10.1364/..

4

Preparation of Germanium-on-insulator (GOI) wafers by means..:

, In: 2020 Symposium on Design, Test, Integration & Packaging of MEMS and MOEMS (DTIP),

Lisker, Marco ; Kruger, Andreas ; Kruger, Patrick... - p. 1-4 , 2020

Link: https://doi.org/10.1109/..

5

(Invited) Graphene Synthesis and Processing on Ge Substrate:

Lukosius, Mindaugas ; Lippert, Gunther ; Dabrowski, J...
ECS Transactions. 75 (2016) 8 - p. 533-540 , 2016

Link: https://doi.org/10.1149/..

6

(Invited) Epitaxial Growth of Low Defect SiGe Buffer Layers..:

Kozlowski, Gregorz ; Fursenko, Oksana ; Zaumseil, Peter...
ECS Transactions. 50 (2013) 9 - p. 613-621 , 2013

Link: https://doi.org/10.1149/..

7

Selective Polycrystalline Si and SiGe Deposition on Epitaxi..:

Yamamoto, Yuji ; Koepke, Klaus ; Fursenko, Oksana...
ECS Transactions. 16 (2008) 10 - p. 503-510 , 2008

Link: https://doi.org/10.1149/..

8

Chemical vapor phase etching of polycrystalline selective t..:

Yamamoto, Yuji ; Tillack, Bernd ; Köpke, Klaus.
Thin Solid Films. 508 (2006) 1-2 - p. 297-300 , 2006

Link: https://doi.org/10.1016/..

9

Determination of optical constants and scattering propertie..:

Bauer, Joachim ; Fursenko, Oksana ; Heinrich, Friedhelm...
https://opus4.kobv.de/opus4-th-wildau/frontdoor/index/index/docId/1566. , 2022

Link: https://opus4.kobv.de/op..

10

Etch mechanism of an Al₂O₃ hard mask in the Bosch process:

Drost, Martin ; Marschmeyer, Steffen ; Fraschke, Mirko...
https://opus4.kobv.de/opus4-th-wildau/frontdoor/index/index/docId/1567. , 2022

Link: https://opus4.kobv.de/op..

11

Diagnostic of graphene on Ge(100)/Si(100) in a 200 mm wafer..:

Fursenko, Oksana ; Lukosius, Mindaugas ; Bauer, Joachim...
https://opus4.kobv.de/opus4-th-wildau/frontdoor/index/index/docId/1608. , 2019

Link: https://opus4.kobv.de/op..

12

Spectroscopic reflectometry for characterization of Through..:

Bauer, Joachim ; Fursenko, Oksana ; Marschmeyer, Steffen...
https://opus4.kobv.de/opus4-th-wildau/frontdoor/index/index/docId/1609. , 2019

Link: https://opus4.kobv.de/op..

13

Development of graphene process control by industrial optic..:

Fursenko, Oksana ; Lukosius, Mindaugas ; Lupina, G...
https://opus4.kobv.de/opus4-th-wildau/frontdoor/index/index/docId/1531. , 2017

Link: https://opus4.kobv.de/op..

14

Very high aspect ratio through silicon via reflectometry:

Bauer, Joachim ; Heinrich, Friedhelm ; Fursenko, Oksana...
https://opus4.kobv.de/opus4-th-wildau/frontdoor/index/index/docId/1375. , 2017

Link: https://opus4.kobv.de/op..

15

3D through silicon via profile metrology based on spectrosc..:

Fursenko, Oksana ; Bauer, Joachim ; Marschmeyer, Steffen
https://opus4.kobv.de/opus4-th-wildau/frontdoor/index/index/docId/1527. , 2016

Link: https://opus4.kobv.de/op..