Galatage, R.
20  Ergebnisse:
Personensuche X
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1

Demonstration of a Stacked CMOS Inverter at 60nm Gate Pitch..:

, In: 2023 International Electron Devices Meeting (IEDM),
 
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2

Process Innovations for Future Technology Nodes with Back-S..:

, In: 2023 International Electron Devices Meeting (IEDM),
Kobrinsky, M. ; Silva, J. D ; Mannebach, E.... - p. 1-4 , 2023
 
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3

High quality interfacial layer formation for Si0.75Ge0.25 (..:

Siddiqui, S. ; Galatage, R. ; Zhao, W....
Microelectronic Engineering.  223 (2020)  - p. 111219 , 2020
 
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10

Remote phonon and surface roughness limited universal elect..:

Sonnet, A.M. ; Galatage, R.V. ; Hurley, P.K....
Microelectronic Engineering.  88 (2011)  7 - p. 1083-1086 , 2011
 
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