Gregušová, D
173  Ergebnisse:
Personensuche X
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2

Local increase in compressive strain (GaN) in gate recessed..:

Mikulics, M ; Kordoš, P ; Gregušová, D...
Semiconductor Science and Technology.  36 (2021)  9 - p. 095040 , 2021
 
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4

Impact of oxide/barrier charge on threshold voltage instabi..:

Ťapajna, M. ; Drobný, J. ; Gucmann, F....
Materials Science in Semiconductor Processing.  91 (2019)  - p. 356-361 , 2019
 
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5

Corrigendum to "Impact of oxide/barrier charge on threshold..:

Ťapajna, M. ; Drobný, J. ; Gucmann, F....
Materials Science in Semiconductor Processing.  93 (2019)  - p. 381 , 2019
 
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11

High resolution physical analysis of ohmic contact formatio..:

Graff, A. ; Simon-Najasek, M. ; Altmann, F....
Microelectronics Reliability.  76-77 (2017)  - p. 338-343 , 2017
 
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13

Influence of oxygen-plasma treatment on AlGaN/GaN metal-oxi..:

Stoklas, R ; Gregušová, D ; Blaho, M...
Semiconductor Science and Technology.  32 (2017)  4 - p. 045018 , 2017
 
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15

Effect of HCl pretreatment on the oxide/semiconductor inter..:

, In: 2016 11th International Conference on Advanced Semiconductor Devices & Microsystems (ASDAM),
Tapajna, M. ; Husekova, K. ; Pohorelec, O.... - p. 207-210 , 2016
 
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