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Hafez, Nessma
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1

Close-to-process strain measurement in ultrasonic vibration..:

Kimme, Simon ; Hafez, Nessma ; Titsch, Christian...
Journal of Sensors and Sensor Systems.  8 (2019)  2 - p. 285-292 , 2019
Link: https://doi.org/10.5194/..
 
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Characterisation of MOS Transistors as an Electromechanical..:

Hafez, Nessma ; Haas, Sven ; Loebel, Kay‐Uwe...
physica status solidi (a).  216 (2018)  19 - p. , 2018
Link: https://doi.org/10.1002/..
 
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3

Close-to-process strain measurement in ultrasonic vibration..:

Kimme, Simon ; Hafez, Nessma ; Titsch, Christian...
Journal of Sensors and Sensor Systems -- http://www.journal-of-sensors-and-sensor-systems.net/ -- http://www.bibliothek.uni-regensburg.de/ezeit/?2733700 -- 2194-878X.  , 2019
Link: https://doi.org/10.5194/..
 
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4

Close-to-process strain measurement in ultrasonic vibration..:

Kimme, Simon ; Hafez, Nessma ; Titsch, Christian...
doi:10.5194/jsss-8-285-2019.  , 2019
Link: https://doi.org/10.5194/..
 
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