Hagiwara, Takuya
336  Ergebnisse:
Personensuche X
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1

Pyruvate kinase deletion as an effective phenotype to enhan..:

Yanase, Masaki ; Aikoh, Tohru ; Sawada, Kazunori...
Journal of Bioscience and Bioengineering.  122 (2016)  2 - p. 160-167 , 2016
 
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2

Effects of phosphoenolpyruvate carboxylase desensitization ..:

Wada, Masaru ; Sawada, Kazunori ; Ogura, Kotaro...
Journal of Bioscience and Bioengineering.  121 (2016)  2 - p. 172-177 , 2016
 
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3

Study on Cone-defects during the Pattern Fabrication Proces..:

Hagiwara, Takuya ; Saito, Kentaro ; Chakihara, Hiraku...
Journal of Photopolymer Science and Technology.  28 (2015)  1 - p. 17-24 , 2015
 
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5

Double Patterning Using Multilayer Hard Mask Process with P..:

Terai, Mamoru ; Shinohara, Masaaki ; Yonekura, Kazumasa...
Japanese Journal of Applied Physics.  50 (2011)  4R - p. 046503 , 2011
 
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6

Double Patterning Using Multilayer Hard Mask Process with P..:

Terai, Mamoru ; Shinohara, Masaaki ; Yonekura, Kazumasa...
Japanese Journal of Applied Physics.  50 (2011)  4R - p. 046503 , 2011
 
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7

Immersion-Specific Defects of High-Receding-Angle Topcoat:

Terai, Mamoru ; Kumada, Teruhiko ; Hagiwara, Takuya...
Japanese Journal of Applied Physics.  49 (2010)  6R - p. 066502 , 2010
 
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8

Surface Segregation Analysis of Hydrophobic Additive of Non..:

Hagiwara, Takuya ; Ishibashi, Takeo ; Terai, Mamoru...
Journal of Photopolymer Science and Technology.  21 (2008)  5 - p. 647-654 , 2008
 
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9

Novel Wafer Bevel Treatment for Water Immersion Lithography:

Terai, Mamoru ; Ishibashi, Takeo ; Hagiwara, Takuya...
Journal of Photopolymer Science and Technology.  21 (2008)  5 - p. 665-672 , 2008
 
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11

Characterization of Fluoropolymer Resist for 157-nm Lithogr..:

Hagiwara, Takuya ; Irie, Shigeo ; Itani, Toshiro...
Journal of Photopolymer Science and Technology.  16 (2003)  4 - p. 557-564 , 2003
 
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12

157-nm Single-Layer Resists Based on Main-Chain-Fluorinated..:

Irie, Shigeo ; Ishikawa, Seiichi ; Hagiwara, Takuya...
Japanese Journal of Applied Physics.  42 (2003)  Part 1, No. 6B - p. 3743-3747 , 2003
 
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13

Analysis of Quencher Diffusion in Chemically Amplified Resi..:

Hattori, Keiko ; Hotta, Shoji ; Hagiwara, Takuya.
Journal of Photopolymer Science and Technology.  13 (2000)  3 - p. 477-484 , 2000
 
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14

A mini review: Fundamental aspects of spin trapping with DM..:

Makino, Keisuke ; Hagiwara, Takuya ; Murakami, Akira
International Journal of Radiation Applications and Instrumentation. Part C. Radiation Physics and Chemistry.  37 (1991)  5-6 - p. 657-665 , 1991
 
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15

Cautionary note for DMPO spin trapping in the presence of i..:

Makino, Keisuke ; Hagiwara, Takuya ; Hagi, Akifumi..
Biochemical and Biophysical Research Communications.  172 (1990)  3 - p. 1073-1080 , 1990
 
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