E-LIB Suche - Ergebnisse für: Itoga, Toshihiko

1

P‐6: A Design Robust Against Hot‐carrier Stress for Low‐tem..:

Shiba, Takeo ; Itoga, Toshihiko ; Toyota, Yoshiaki...
SID Symposium Digest of Technical Papers. 33 (2002) 1 - p. 220-223 , 2002

Link: https://doi.org/10.1889/..

2

12.1: 45°C Low‐Temperature Poly‐Si TFT Fabrication Process ..:

Ohkura, Makoto ; Shimomura, Shigeo ; Miyazawa, Toshio..
SID Symposium Digest of Technical Papers. 33 (2002) 1 - p. 146-149 , 2002

Link: https://doi.org/10.1889/..

3

New Technique to Determine Gettering Efficiency of Heavy Me..:

Itoga, Toshihiko ; Hozawa, Kazuyuki ; Takeda, Kazuo..
Japanese Journal of Applied Physics. 40 (2001) 4R - p. 2105 , 2001

Link: https://doi.org/10.1143/..

4

The Effect of Isopropyl Alcohol Adsorption on the Electrica..:

Motai, Kumi ; Itoga, Toshihiko ; Irie, Takashi
Japanese Journal of Applied Physics. 37 (1998) 3S - p. 1137 , 1998

Link: https://doi.org/10.1143/..

5

The Increase of the Native Oxide Thickness on H-Terminated ..:

Itoga, Toshihiko ; Kojima, Hisao ; Jiro Yugami, Jiro Yugami.
Japanese Journal of Applied Physics. 36 (1997) 3S - p. 1578 , 1997

Link: https://doi.org/10.1143/..

6

Degradation of n+/p Junction Characteristics by Aluminum Co..:

Itoga, Toshihiko ; Kojima, Hisao ; Atsushi Hiraiwa, Atsushi Hiraiwa.
Japanese Journal of Applied Physics. 36 (1997) 7R - p. 4431 , 1997

Link: https://doi.org/10.1143/..

7

X-Ray Photoelectron Spectroscopy Study of Native Oxidation ..:

Yano, Fumiko ; Toshihiko Itoga, Toshihiko Itoga ; Keiichi Kanehori, Keiichi Kanehori
Japanese Journal of Applied Physics. 36 (1997) 6A - p. L670 , 1997

Link: https://doi.org/10.1143/..

8

Influence of ion-implantation on native oxidation of Si in ..:

Yano, Fumiko ; Hiraoka, Akiko ; Itoga, Toshihiko...
Applied Surface Science. 100-101 (1996) - p. 138-142 , 1996

Link: https://doi.org/10.1016/..

9

A Ceramic Plasma Torch for Determining Silicon Content in H..:

Matsubara, Atsuko ; Kojima, Hisao ; Toshihiko Itoga, Toshihiko Itoga.
Japanese Journal of Applied Physics. 35 (1996) 8R - p. 4541 , 1996

Link: https://doi.org/10.1143/..

10

Development of ammonia adsorption filter and its applicatio..:

SAIKI, Atsushi ; OSHIO, Ryoji ; SUZUKI, Michio...
Journal of Photopolymer Science and Technology. 8 (1995) 4 - p. 599-606 , 1995

Link: https://doi.org/10.2494/..

11

Ultra-Shallow Depth Profiling of Arsenic Implants in Silico..:

Matsubara, Atsuko ; Kojima, Hisao ; Itoga, Toshihiko.
Japanese Journal of Applied Physics. 34 (1995) 8R - p. 3965 , 1995

Link: https://doi.org/10.1143/..

12

Development of Ammonia Adsorption Filter and Its Applicatio..:

Saiki, Atsushi ; Oshio, Ryoji ; Suzuki, Michio...
Japanese Journal of Applied Physics. 33 (1994) 5R - p. 2504 , 1994

Link: https://doi.org/10.1143/..

13

Improving hot-electron hardness of narrow channel MOSFETs b..:

Nishioka, Yasushiro ; Itoga, Toshihiko ; Ohyu, Kiyonori.
Solid-State Electronics. 34 (1991) 11 - p. 1197-1200 , 1991

Link: https://doi.org/10.1016/..

14

Photoluminescence and Acceptor State of Na in ZnSe:

Isshiki, Minoru ; Itoga, Toshihiko ; Masumoto, Katashi.
Japanese Journal of Applied Physics. 30 (1991) 4R - p. 623 , 1991

Link: https://doi.org/10.1143/..

15

Advantages of Fluorine Introduction in Boron Implanted Shal..:

Ohyu, Kiyonori ; Itoga, Toshihiko ; Natsuaki, Nobuyoshi
Japanese Journal of Applied Physics. 29 (1990) 3R - p. 457 , 1990

Link: https://doi.org/10.1143/..