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Joo, Young-Hee
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1

Etching characteristics and surface modification of InGaSnO..:

JOO, Young-Hee ; CHOI, Jae-Won ; HOU, Bo...
Plasma Science and Technology.  25 (2023)  10 - p. 105502 , 2023
Link: https://doi.org/10.1088/..
 
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2

Plasma etching and surface characteristics depending on the..:

Lee, Han Byeol ; Joo, Young-Hee ; Patil, Harshada...
Materials Research Express.  10 (2023)  1 - p. 016401 , 2023
Link: https://doi.org/10.1088/..
 
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3

Etching characteristics and surface properties of fluorine-..:

Yu, Wenhui ; Lee, Jeong Geun ; Joo, Young-Hee...
Applied Physics A.  128 (2022)  10 - p. , 2022
Link: https://doi.org/10.1007/..
 
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4

Surface properties of Al-doped ZnO thin film before and aft..:

JOO, Young-Hee ; KIM, Gwan-Ha ; UM, Doo-Seung.
Plasma Science and Technology.  24 (2022)  7 - p. 075504 , 2022
Link: https://doi.org/10.1088/..
 
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5

BCl3/Ar plasma etching for the performance enhancement of A..:

Joo, Young-Hee ; Jin, Mi-Jin ; Kim, Sung Kyun..
Applied Surface Science.  561 (2021)  - p. 149957 , 2021
Link: https://doi.org/10.1016/..
 
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6

Etching Characteristics and Changes in Surface Properties o..:

Lee, Chea-Young ; Joo, Young-Hee ; Kim, Minsoo P...
Coatings.  11 (2021)  8 - p. 906 , 2021
Link: https://doi.org/10.3390/..
 
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7

Tunable physical properties of Al-doped ZnO thin films by O..:

Joo, Young-Hee ; Um, Doo-Seung ; Kim, Chang-Il
Materials Research Express.  8 (2021)  12 - p. 126402 , 2021
Link: https://doi.org/10.1088/..
 
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8

High-density plasma etching characteristics of aluminum-dop..:

Zhang, Liting ; Joo, Young-Hee ; Um, Doo-Seung.
Materials Research Express.  7 (2020)  10 - p. 106301 , 2020
Link: https://doi.org/10.1088/..
 
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9

Work Function Tuning of Zinc–Tin Oxide Thin Films Using Hig..:

Joo, Young-Hee ; Wi, Jae-Hyung ; Lee, Woo-Jung...
Coatings.  10 (2020)  11 - p. 1026 , 2020
Link: https://doi.org/10.3390/..
 
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10

High-density plasma etching characteristics of indium–galli..:

Joo, Young-Hee ; Kim, Chang-Il
Thin Solid Films.  583 (2015)  - p. 40-45 , 2015
Link: https://doi.org/10.1016/..
 
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11

Etching properties of Na0.5K0.5NbO3 thin films by using ind..:

Joo, Young-Hee ; Woo, Jong-Chang ; Kim, Chang-Il
Microelectronic Engineering.  114 (2014)  - p. 1-6 , 2014
Link: https://doi.org/10.1016/..
 
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12

Influences of film thickness and annealing temperature on p..:

Lee, Sang-Min ; Joo, Young-Hee ; Kim, Chang-Il
Applied Surface Science.  320 (2014)  - p. 494-501 , 2014
Link: https://doi.org/10.1016/..
 
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13

Surface Chemical Reaction on HfO2Thin Film Etched by High D..:

Kang, Pil-Seung ; Woo, Jong-Chang ; Joo, Young-Hee.
Ferroelectrics.  454 (2013)  1 - p. 91-98 , 2013
Link: https://doi.org/10.1080/..
 
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14

Dry Etch Properties of ZTO Thin Films Using Inductively Cou..:

Kim, Han-Soo ; Woo, Jong-Chang ; Joo, Young-Hee.
Ferroelectrics.  454 (2013)  1 - p. 99-109 , 2013
Link: https://doi.org/10.1080/..
 
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15

Surface reaction effects on dry etching of IGZO thin films ..:

Joo, Young-Hee ; Woo, Jong-Chang ; Kim, Chang-Il
Microelectronic Engineering.  112 (2013)  - p. 74-79 , 2013
Link: https://doi.org/10.1016/..
 
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