Kashkoush, Ismail
9  Ergebnisse:
Personensuche X
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1

Effect of Dissolved Ozone and In-Situ Wafer Cleaning on Pre..:

, In: 2020 China Semiconductor Technology International Conference (CSTIC),
 
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2

Application of In-situ Pre-epi Clean Process for Next Gener..:

, In: 2019 16th China International Forum on Solid State Lighting & 2019 International Forum on Wide Bandgap Semiconductors China (SSLChina: IFWS),
Waugh, Darian ; Chen, Gim ; Boecker, Jennifer. - p. 14-17 , 2019
 
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4

Effective Use of UV‐Ozone Oxide in Silicon Solar Cell Appli..:

Zin, Ngwe ; Bakhshi, Sara ; Gao, Munan...
physica status solidi (RRL) – Rapid Research Letters.  13 (2018)  2 - p. , 2018
 
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7

THE EFFECT OF TIME, TEMPERATURE AND PARTICLE SIZE ON SUBMIC..:

BUSNAINA, AHMED ; KASHKOUSH, ISMAIL
Chemical Engineering Communications.  125 (1993)  1 - p. 47-61 , 1993
 
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8

SUBMICRON PARTICLE REMOVAL USING ULTRASONIC CLEANING:

KASHKOUSH, ISMAIL ; BUSNAINA, AHMBD
Particulate Science and Technology.  11 (1993)  1-2 - p. 11-24 , 1993
 
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9

An Experimental Study of Megasonic Cleaning of Silicon Wafe..:

Busnaina, Ahmed A. ; Kashkoush, Ismail I. ; Gale, Glenn W.
Journal of The Electrochemical Society.  142 (1995)  8 - p. 2812-2817 , 1995
 
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