E-LIB Suche - Ergebnisse für: Kim, Woo-Kyu

1

Leaching Phenomena and their Suppresion in 193 nm Immersion..:

Dammel, Ralph R. ; Pawlowski, Georg ; Romano, Andrew...
Journal of Photopolymer Science and Technology. 18 (2005) 5 - p. 593-602 , 2005

Link: https://doi.org/10.2494/..

2

193 nm Resist Line Collapse Study by Modifying the Resist P..:

Tanaka, Keiichi ; Yamada, Yoshiaki ; Masuda, Seiya...
Journal of Photopolymer Science and Technology. 17 (2004) 4 - p. 527-534 , 2004

Link: https://doi.org/10.2494/..

3

Influence of ArF Resist Components and Process Conditions o..:

Padmanaban, Munirathna ; Anyadiegwu, Clement ; Kanda, Takashi...
Journal of Photopolymer Science and Technology. 16 (2003) 4 - p. 475-481 , 2003

Link: https://doi.org/10.2494/..

4

Optimization of 193 nm Contact Hole Resists for 100 nm Node:

Kudo, Takanori ; Alemy, Eric L. ; Dammel, Ralph R....
Journal of Photopolymer Science and Technology. 15 (2002) 4 - p. 549-558 , 2002

Link: https://doi.org/10.2494/..

5

Etch Properties of 193nm Resists: Issues and Approaches:

Padmanaban, Munirathna ; Alemy, Eric ; Dammel, Ralph...
Journal of Photopolymer Science and Technology. 15 (2002) 3 - p. 521-527 , 2002

Link: https://doi.org/10.2494/..

6

The (Ph)2nacnac Ligand in Organochromium Chemistry:

MacAdams, Leonard A. ; Kim, Woo-Kyu ; Liable-Sands, Louise M....
Organometallics. 21 (2002) 5 - p. 952-960 , 2002

Link: https://doi.org/10.1021/..

7

Mechanistic Studies on the CD Degradation of 193nm Resists ..:

Kudo, Takanori ; Dammel, Ralph R. ; Bae, Jun-Born...
Journal of Photopolymer Science and Technology. 14 (2001) 3 - p. 407-417 , 2001

Link: https://doi.org/10.2494/..

8

Materials and Resists for 193 and 157nm Applications:

Padmanaban, Munirathna ; Alemy, Eric ; Bae, Jun-Bom...
Journal of Photopolymer Science and Technology. 14 (2001) 4 - p. 631-642 , 2001

Link: https://doi.org/10.2494/..

9

Layer-Specific Resists for 193nm Lithography:

Padmanaban, Munirathna ; Bae, Jun-Bom ; Kim, Woo-Kyu...
Journal of Photopolymer Science and Technology. 13 (2000) 4 - p. 607-615 , 2000

Link: https://doi.org/10.2494/..

10

Sensitized Transparent Photobase Additive For 193 nm Lithog..:

Padmanaban, Munirathna ; Bae, Jun-Born ; Cook, Michelle...
Journal of Photopolymer Science and Technology. 13 (2000) 4 - p. 617-624 , 2000

Link: https://doi.org/10.2494/..

11

[(Ph)2nacnac]MCl2(THF)2 (M = Ti, V, Cr): A New Class of Ho..:

Kim, Woo-Kyu ; Fevola, Michael J. ; Liable-Sands, Louise M...
Organometallics. 17 (1998) 21 - p. 4541-4543 , 1998

Link: https://doi.org/10.1021/..

12

Electrical Cardioversion of Atrial Fibrillation after Succe..:

Cho, Sung Je ; Lee, Sang Hoon ; Kim, Woo Kyu...
Korean Circulation Journal. 28 (1998) 8 - p. 1293 , 1998

Link: https://doi.org/10.4070/..

13

Complex Electro-Optic Frequency-Response Characterization o..:

, In: 2024 IEEE Silicon Photonics Conference (SiPhotonics),

Jo, Youngkwan ; Ji, Yongjin ; Kim, Hyun-Kyu... - p. 1-2 , 2024

Link: https://doi.org/10.1109/..

14

Assessing the Benthic Ecological Quality in the Intertidal ..:

Liang, Jian ; Ma, Chae-Woo ; Kim, Seon-Kyu.
Water. 16 (2024) 2 - p. 272 , 2024

Link: https://doi.org/10.3390/..

15

Using Benthic Indices to Assess the Ecological Quality of S..:

Liang, Jian ; Shu, Meng-Yuan ; Huang, Hai-Rui..
Journal of Marine Science and Engineering. 12 (2024) 3 - p. 487 , 2024

Link: https://doi.org/10.3390/..