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Klüpfel, Fabian
22  Ergebnisse:
Personensuche X
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1

Scaling-aware TCAD Parameter Extraction Methodology for Mob..:

, In: 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD),
Medina-Bailon, Cristina ; Dutta, Tapas ; Klupfel, Fabian... - p. 1-4 , 2019
Link: https://doi.org/10.1109/..
 
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2

A Compact Model Based on Bardeen's Transfer Hamiltonian For..:

Klupfel, Fabian J.
IEEE Access.  7 (2019)  - p. 84053-84065 , 2019
Link: https://doi.org/10.1109/..
 
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3

Influence of Sacrificial Layer Germanium Content on Stacked..:

Klupfel, Fabian J.
IEEE Access.  7 (2019)  - p. 85855-85859 , 2019
Link: https://doi.org/10.1109/..
 
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4

From devices to circuits: modelling the performance of 5nm ..:

, In: 2019 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD),
Brown, Andrew R. ; Millar, Campbell ; Lorenz, Jurgen K.... - p. 1-4 , 2019
Link: https://doi.org/10.1109/..
 
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5

Process Variability—Technological Challenge and Design Issu..:

Lorenz, Jürgen ; Bär, Eberhard ; Barraud, Sylvain...
Micromachines.  10 (2018)  1 - p. 6 , 2018
Link: https://doi.org/10.3390/..
 
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6

Oxide bipolar electronics: materials, devices and circuits:

Grundmann, Marius ; Klüpfel, Fabian ; Karsthof, Robert...
Journal of Physics D: Applied Physics.  49 (2016)  21 - p. 213001 , 2016
Link: https://doi.org/10.1088/..
 
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7

Ring Oscillators Based on ZnO Channel JFETs and MESFETs:

Klüpfel, Fabian J. ; von Wenckstern, Holger ; Grundmann, Marius
Advanced Electronic Materials.  2 (2016)  7 - p. , 2016
Link: https://doi.org/10.1002/..
 
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8

Field‐Effect Transistors: Ring Oscillators Based on ZnO Cha..:

Klüpfel, Fabian J. ; von Wenckstern, Holger ; Grundmann, Marius
Advanced Electronic Materials.  2 (2016)  7 - p. , 2016
Link: https://doi.org/10.1002/..
 
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9

CMOS-compatible manufacturability of sub-15 nm Si/SiO$_2$/S..:

von Borany, Johannes ; Engelmann, Hans-Juergen ; Heinig, Karl-Heinz...
info:eu-repo/semantics/altIdentifier/doi/10.1088/1361-6641/acbe5d.  , 2023
Link: https://cea.hal.science/..
 
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10

CMOS-compatible manufacturability of sub-15 nm Si/SiO$_2$/S..:

von Borany, Johannes ; Engelmann, Hans-Juergen ; Heinig, Karl-Heinz...
info:eu-repo/semantics/altIdentifier/doi/10.1088/1361-6641/acbe5d.  , 2023
Link: https://cea.hal.science/..
 
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11

CMOS-compatible manufacturability of sub-15 nm Si/SiO2/Si n..:

Borany, Johannes von ; Engelmann, Hans-Jürgen ; Heinig, Karl-Heinz...
Semiconductor Science and Technology.  , 2023
Link: https://publica.fraunhof..
 
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12

Data publication: CMOS-compatible manufacturability of sub-..:

von Borany, Johannes ; Engelmann, Hans-Jürgen ; Heinig, Karl-Heinz...
doi:10.17815/jlsrf-3-159.  , 2022
Link: https://rodare.hzdr.de/r..
 
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13

Compact Model for a Silicon Single Electron Transistor in a..:

Klüpfel, Fabian J ; Pichler, Peter
10.1109/ACCESS.2019.2924913.  , 2021
Link: https://fordatis.fraunho..
 
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14

Process Variability—Technological Challenge and Design Issu..:

Lorenz, Jürgen ; Bär, Eberhard ; Barraud, Sylvain...
info:eu-repo/semantics/altIdentifier/doi/10.3390/mi10010006.  , 2019
Link: https://hal-cea.archives..
 
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15

Process Variability—Technological Challenge and Design Issu..:

Lorenz, Jürgen ; Bär, Eberhard ; Barraud, Sylvain...
info:eu-repo/semantics/altIdentifier/doi/10.3390/mi10010006.  , 2019
Link: https://cea.hal.science/..
 
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