Koike, Mitsuo
82  Ergebnisse:
Personensuche X
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2

Reduction of surface roughness and defect density by cryoge..:

Murakoshi, Atsushi ; Iwase, Masao ; Niiyama, Hiromi..
Japanese Journal of Applied Physics.  53 (2014)  6 - p. 066507 , 2014
 
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3

Ultralow Contact Resistivity for a Metal/p-Type Silicon Int..:

Murakoshi, Atsushi ; Iwase, Masao ; Niiyama, Hiromi..
Japanese Journal of Applied Physics.  52 (2013)  7R - p. 075802 , 2013
 
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5

Effect of Film Composition of Nitrogen Incorporated Hafnium..:

Koyama, Masato ; Kamimuta, Yuuichi ; Koike, Mitsuo..
Japanese Journal of Applied Physics.  43 (2004)  4S - p. 1788 , 2004
 
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6

Mechanism of Defect Formation during Low-Temperature Si Epi..:

Mizushima, Ichiro ; Koike, Mitsuo ; Sato, Tsutomu..
Japanese Journal of Applied Physics.  38 (1999)  4S - p. 2415 , 1999
 
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7

Precipitation of Boron in Highly Boron-Doped Silicon:

Mizushima, Ichiro ; Mitani, Yuichiro ; Koike, Mitsuo...
Japanese Journal of Applied Physics.  37 (1998)  3S - p. 1171 , 1998
 
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10

Anomalous Junction Leakage Behavior of Ti Self Aligned Sili..:

Sakata, Atsuko ; Tomita, Mitsuhiro ; Koike, Mitsuo..
Japanese Journal of Applied Physics.  36 (1997)  3S - p. 1558 , 1997
 
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13

UVA causes specific mutagenic DNA damage through ROS produc..:

Negishi, Tomoe ; Xing, Fang ; Koike, Ryota...
Mutation Research/Genetic Toxicology and Environmental Mutagenesis.  887 (2023)  - p. 503616 , 2023
 
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