Kordina, Olof
56  Ergebnisse:
Personensuche X
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1

Impact of in situ NH3 pre-treatment of LPCVD SiN passivatio..:

Chen, Ding-Yuan ; Persson, Axel R ; Wen, Kai-Hsin...
Semiconductor Science and Technology.  37 (2022)  3 - p. 035011 , 2022
 
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6

A versatile low-resistance ohmic contact process with ohmic..:

Lin, Yen-Ku ; Bergsten, Johan ; Leong, Hector...
Semiconductor Science and Technology.  33 (2018)  9 - p. 095019 , 2018
 
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8

Ab Initio Study of Growth Mechanism of 4H–SiC: Adsorption a..:

Sukkaew, Pitsiri ; Danielsson, Örjan ; Kordina, Olof..
The Journal of Physical Chemistry C.  121 (2017)  2 - p. 1249-1256 , 2017
 
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9

Growth Mechanism of SiC Chemical Vapor Deposition: Adsorpti..:

Sukkaew, Pitsiri ; Kalered, Emil ; Janzén, Erik...
The Journal of Physical Chemistry C.  122 (2017)  1 - p. 648-661 , 2017
 
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10

Silicon Chemistry in Fluorinated Chemical Vapor Deposition ..:

Stenberg, Pontus ; Sukkaew, Pitsiri ; Farkas, Ildiko...
The Journal of Physical Chemistry C.  121 (2017)  5 - p. 2711-2720 , 2017
 
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15

Thermochemical Properties of Halides and Halohydrides of Si..:

Sukkaew, Pitsiri ; Ojamäe, Lars ; Kordina, Olof..
ECS Journal of Solid State Science and Technology.  5 (2015)  2 - p. P27-P35 , 2015
 
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