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Kumasaka, Fumiaki
17  Ergebnisse:
Personensuche X
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1

Optimization of the composition in a composite material for..:

Imanaka, Yoshihiko ; Anazawa, Toshihisa ; Kumasaka, Fumiaki.
Scientific Reports.  11 (2021)  1 - p. , 2021
Link: https://doi.org/10.1038/..
 
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2

An artificial photosynthesis anode electrode composed of a ..:

Imanaka, Yoshihiko ; Anazawa, Toshihisa ; Manabe, Toshio...
Scientific Reports.  6 (2016)  1 - p. , 2016
Link: https://doi.org/10.1038/..
 
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3

Nanoparticulate BaTiO3 film produced by aerosol-type nanopa..:

Imanaka, Yoshihiko ; Amada, Hideyuki ; Kumasaka, Fumiaki..
Journal of Nanoparticle Research.  18 (2016)  4 - p. , 2016
Link: https://doi.org/10.1007/..
 
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4

Dielectric and Insulating Properties of Embedded Capacitor ..:

Imanaka, Yoshihiko ; Amada, Hideyuki ; Kumasaka, Fumiaki
Japanese Journal of Applied Physics.  52 (2013)  5S1 - p. 05DA02 , 2013
Link: https://doi.org/10.7567/..
 
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5

Nanoparticulated Dense and Stress‐Free Ceramic Thick Film f..:

Imanaka, Yoshihiko ; Amada, Hideyuki ; Kumasaka, Fumiaki...
Advanced Engineering Materials.  15 (2013)  11 - p. 1129-1135 , 2013
Link: https://doi.org/10.1002/..
 
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6

Microstructure and Dielectric Properties of Composite Films..:

Imanaka, Yoshihiko ; Amada, Hideyuki ; Kumasaka, Fumiaki
International Journal of Applied Ceramic Technology.  8 (2011)  3 - p. 653-657 , 2011
Link: https://doi.org/10.1111/..
 
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7

Performance of molecular resist based on polyphenol in EUV ..:

Oizumi, Hiroaki ; Kumasaka, Fumiaki ; Tanaka, Yuusuke...
Microelectronic Engineering.  83 (2006)  4-9 - p. 1107-1110 , 2006
Link: https://doi.org/10.1016/..
 
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8

High-Performance X-Ray Mask Fabrication Using TaGeN Absorbe..:

Iba, Yoshihisa ; Taguchi, Takao ; Iizuka, Takashi...
Japanese Journal of Applied Physics.  40 (2001)  4B - p. L410 , 2001
Link: https://doi.org/10.1143/..
 
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9

Amorphous Refractory Compound Film Material for X-Ray Mask ..:

Iba, Yoshihisa ; Kumasaka, Fumiaki ; Iizuka, Takashi.
Japanese Journal of Applied Physics.  39 (2000)  9R - p. 5329 , 2000
Link: https://doi.org/10.1143/..
 
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10

Sub-100-nm Device Fabrication using Proximity X-Ray Lithogr..:

Iba, Yoshihisa ; Taguchi, Takao ; Kumasaka, Fumiaki...
Japanese Journal of Applied Physics.  39 (2000)  12S - p. 6952 , 2000
Link: https://doi.org/10.1143/..
 
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11

Pattern Fabrication Technique for Ta–Ge Amorphous X-Ray Abs..:

Iba, Yoshihisa ; Kumasaka, Fumiaki ; MasakiYamabe, MasakiYamabe
Japanese Journal of Applied Physics.  38 (1999)  4R - p. 2164 , 1999
Link: https://doi.org/10.1143/..
 
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12

Etching Residues of Sputtered Ta Film Using Chlorine-Based ..:

Iba, Yoshihisa ; Kumasaka, Fumiaki ; Takeda, Masayuki..
Japanese Journal of Applied Physics.  37 (1998)  2B - p. L251 , 1998
Link: https://doi.org/10.1143/..
 
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13

Pattern Etching of Ta X-ray Mask Absorber on SiC Membrane b..:

Iba, Yoshihisa ; Kumasaka, Fumiaki ; Aoyama, Hajime..
Japanese Journal of Applied Physics.  37 (1998)  7A - p. L824 , 1998
Link: https://doi.org/10.1143/..
 
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14

Precise Stress Control of Ta Absorber using Low Stress Alum..:

Iba, Yoshihisa ; Kumasaka, Fumiaki ; Aoyama, Hajime..
Japanese Journal of Applied Physics.  35 (1996)  12S - p. 6463 , 1996
Link: https://doi.org/10.1143/..
 
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15

Optimization of the composition in a composite material for..:

Imanaka, Yoshihiko ; Anazawa, Toshihisa ; Kumasaka, Fumiaki.
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC7862485/.  , 2021
Link: http://www.ncbi.nlm.nih...
 
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