E-LIB Suche - Ergebnisse für: Kwon, Kwang‐Ho

1

Noble gas effect on ACL etching selectivity to SiO2 films:

Choi, Gilyoung ; Efremov, Alexander ; Son, Hye Jun.
Plasma Processes and Polymers. 20 (2023) 8 - p. , 2023

Link: https://doi.org/10.1002/..

2

On Relationships between Plasma Chemistry and Surface React..:

Baek, Seung Yong ; Efremov, Alexander ; Bobylev, Alexander..
Materials. 16 (2023) 14 - p. 5043 , 2023

Link: https://doi.org/10.3390/..

3

Individual Effects of Various Plasma-Related Factors on the..:

Son, Hye Jun ; Efremov, Alexander ; Choi, Gilyoung.
Plasma Chemistry and Plasma Processing. 44 (2023) 1 - p. 635-649 , 2023

Link: https://doi.org/10.1007/..

4

On mechanisms to control SiO2 etching kinetics in low-power..:

Choi, Gilyoung ; Efremov, Alexander ; Lee, Dae-Kug..
Vacuum. 216 (2023) - p. 112484 , 2023

Link: https://doi.org/10.1016/..

5

Etching kinetics and dielectric properties of SiOC films ex..:

Oh, Younghun ; Efremov, Alexander ; Lee, Junmyung...
Thin Solid Films. 749 (2022) - p. 139185 , 2022

Link: https://doi.org/10.1016/..

6

High‐aspect‐ratio oxide etching using CF4/C6F12O plasma in ..:

Kim, Jinhyuk ; Choi, Gilyoung ; Kwon, Kwang‐Ho
Plasma Processes and Polymers. 20 (2022) 3 - p. , 2022

Link: https://doi.org/10.1002/..

7

On mechanisms influencing etching/polymerization balance in..:

Efremov, Alexander ; Son, Hye Jun ; Choi, Gilyoung.
Vacuum. 206 (2022) - p. 111518 , 2022

Link: https://doi.org/10.1016/..

8

Comparative study of Cl2 + O2 and HBr + O2 plasma chemistri..:

Lim, Nomin ; Efremov, Alexander ; Kwon, Kwang-Ho
Vacuum. 186 (2021) - p. 110043 , 2021

Link: https://doi.org/10.1016/..

9

Dry Etching Performance and Gas-Phase Parameters of C6F12O ..:

Lim, Nomin ; Choi, Yeon Sik ; Efremov, Alexander.
Materials. 14 (2021) 7 - p. 1595 , 2021

Link: https://doi.org/10.3390/..

10

Erratum to: Gas‐phase chemistry and reactive‐ion etching ki..:

Lee, Byung J. ; Efremov, Alexander ; Kwon, Kwang‐Ho
Plasma Processes and Polymers. , 2021

Link: https://doi.org/10.1002/..

11

Gas‐phase chemistry and reactive‐ion etching kinetics for s..:

Lee, Byung Jun ; Efremov, Alexander ; Kwon, Kwang‐Ho
Plasma Processes and Polymers. 18 (2021) 7 - p. 2000249 , 2021

Link: https://doi.org/10.1002/..

12

A Comparison of CF4, CHF3 and C4F8 + Ar/O2 Inductively Coup..:

Lim, Nomin ; Efremov, Alexander ; Kwon, Kwang-Ho
Plasma Chemistry and Plasma Processing. 41 (2021) 6 - p. 1671-1689 , 2021

Link: https://doi.org/10.1007/..

13

Comparative study of CF4 + O2 and C6F12O + O2 plasmas for r..:

Lim, Nomin ; Efremov, Alexander ; Woo, Byungjun.
Plasma Processes and Polymers. 19 (2021) 2 - p. , 2021

Link: https://doi.org/10.1002/..

14

Sidewall chemical analysis of plasma-etched nano-patterns u..:

Lee, Jaemin ; Lee, Hyun Woo ; Kwon, Kwang-Ho
Applied Surface Science. 545 (2021) - p. 148907 , 2021

Link: https://doi.org/10.1016/..

15

On Relationships between Gas-Phase Chemistry and Reactive I..:

Efremov, Alexander ; Lee, Byung Jun ; Kwon, Kwang-Ho
Materials. 14 (2021) 6 - p. 1432 , 2021

Link: https://doi.org/10.3390/..