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Lawrie, Kirsten J.
6  Ergebnisse:
Personensuche X
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1

Extreme ultraviolet (EUV) degradation of poly(olefin sulfon..:

Lawrie, Kirsten ; Blakey, Idriss ; Blinco, James...
Radiation Physics and Chemistry.  80 (2011)  2 - p. 236-241 , 2011
Link: https://doi.org/10.1016/..
 
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2

Polysulfone based non-CA resists for 193nm immersion lithog..:

Chen, Lan ; Goh, Yong-Keng ; Lawrie, Kirsten...
Radiation Physics and Chemistry.  80 (2011)  2 - p. 242-247 , 2011
Link: https://doi.org/10.1016/..
 
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3

Chain scission resists for extreme ultraviolet lithography ..:

Lawrie, Kirsten J. ; Blakey, Idriss ; Blinco, James P....
Journal of Materials Chemistry.  21 (2011)  15 - p. 5629 , 2011
Link: https://doi.org/10.1039/..
 
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4

Synthesis and Polymerization Studies of Organic‐Soluble Eum..:

Lawrie, Kirsten J. ; Meredith, Paul ; McGeary, Ross P.
Photochemistry and Photobiology.  84 (2008)  3 - p. 632-638 , 2008
Link: https://doi.org/10.1111/..
 
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5

Reactogenicity and immunogenicity after a late second dose ..:

Flaxman, Amy ; Marchevsky, Natalie G ; Jenkin, Daniel...
http://eprints.gla.ac.uk/260578/1/260578.pdf.  , 2021
Link: http://eprints.gla.ac.uk..
 
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6

The Edinburgh High Risk Study: current status and future pr..:

JOHNSTONE, EVE C ; RUSSELL, KIRSTEN D ; HARRISON, LESLEY K.
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC1525062.  , 2003
Link: http://www.ncbi.nlm.nih...
 
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