Lee, Byung Jun
27766  Ergebnisse:
Personensuche X
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3

Plasma Parameters and Silicon Etching Kinetics in C4F8 + O2..:

Lee, Byung Jun ; Efremov, Alexander ; Nam, Yunho.
Plasma Chemistry and Plasma Processing.  40 (2020)  5 - p. 1365-1380 , 2020
 
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6

Peculiarities of Si and SiO2 Etching Kinetics in HBr + Cl2 ..:

Lee, Byung Jun ; Efremov, Alexander ; Kim, Jihun..
Plasma Chemistry and Plasma Processing.  39 (2018)  1 - p. 339-358 , 2018
 
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8

Etching Kinetics and Mechanisms of SiC Thin Films in F-, Cl..:

Lee, Byung Jun ; Efremov, Alexander ; Lee, Junmyung.
Plasma Chemistry and Plasma Processing.  39 (2018)  1 - p. 325-338 , 2018
 
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11

Etching Characteristics and Mechanisms of TiO2 Thin Films i..:

Lee, Junmyung ; Efremov, Alexander ; Lee, Byung Jun.
Plasma Chemistry and Plasma Processing.  36 (2016)  6 - p. 1571-1588 , 2016
 
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12

Electrochemical Characterization of Electric Double Layer C..:

Cho, Jinhyun ; Shin, Won-Kyung ; Kim, Dong-Won...
Journal of Electrochemical Science and Technology.  7 (2016)  3 - p. 199-205 , 2016
 
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