Lim, Nomin
13  Ergebnisse:
Personensuche X
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2

A Comparison of CF4, CHF3 and C4F8 + Ar/O2 Inductively Coup..:

Lim, Nomin ; Efremov, Alexander ; Kwon, Kwang-Ho
Plasma Chemistry and Plasma Processing.  41 (2021)  6 - p. 1671-1689 , 2021
 
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5

Etching Kinetics and Surface Conditions for KNbxOy Thin Fil..:

Lim, Nomin ; Efremov, Alexander ; Hwang, Hyun-Gyu..
Plasma Chemistry and Plasma Processing.  40 (2020)  2 - p. 625-640 , 2020
 
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10

Etching characteristics and mechanisms of Mo thin films in ..:

Lim, Nomin ; Efremov, Alexander ; Yeom, Geun Young..
Japanese Journal of Applied Physics.  53 (2014)  11 - p. 116201 , 2014
 
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