E-LIB Suche - Ergebnisse für: Linholm, L.W.

1

Electrical linewidth standards for advanced lithography cha..:

Linholm, L.W. ; Allen, R.A. ; Cresswell, M.W....
Computer Standards & Interfaces. 21 (1999) 2 - p. 190 , 1999

Link: https://doi.org/10.1016/..

2

CMOS Process Monitor:

, In: Proceedings of the IEEE International Conference on Microelectronic Test Structures,

Buehler, M.G. ; Linholm, L.W. ; Tyree, V.C.... - p. 164,165,166,167,168 , 1988

Link: https://doi.org/10.1109/..

3

An Improved Test Structure and Kelvin‐Measurement Method fo..:

Mazer, J. A. ; Linholm, L. W. ; Saxena, A. N.
Journal of The Electrochemical Society. 132 (1985) 2 - p. 440-443 , 1985

Link: https://doi.org/10.1149/..

4

Comparison of microelectronic test structures for propagati..:

Radacks, D.J. ; Yao, C.T. ; Linholm, L.W...
Microelectronics Journal. 16 (1985) 6 - p. 39-46 , 1985

Link: https://doi.org/10.1016/..

5

An Electrical Test Structure for Proximity Effects Measurem..:

Yen, D. ; Linholm, L. W. ; Glendinning, W. B.
Journal of The Electrochemical Society. 132 (1985) 7 - p. 1726-1729 , 1985

Link: https://doi.org/10.1149/..

6

Minimum test chip sample size selection for characterizing ..:

Suehle, J.S. ; Linholm, L.W. ; Kafadar, K.
IEEE Journal of Solid-State Circuits. 19 (1984) 1 - p. 123-130 , 1984

Link: https://doi.org/10.1109/..

7

A Cross‐Bridge Test Structure for Evaluating the Linewidth ..:

Yen, D. ; Linholm, L. W. ; Buehler, M. G.
Journal of The Electrochemical Society. 129 (1982) 10 - p. 2313-2318 , 1982

Link: https://doi.org/10.1149/..

8

An optimized output stage for MOS integrated circuits:

Linholm, L.W.
IEEE Journal of Solid-State Circuits. 10 (1975) 2 - p. 106-109 , 1975

Link: https://doi.org/10.1109/..

9

Reference-length shortening by Kelvin voltage taps in linew..:

Lee, William E. ; Guthrie, William F. ; Cresswell, Michael W....
Computer Standards & Interfaces. 21 (1999) 2 - p. 193 , 1999

Link: https://doi.org/10.1016/..

10

Recent Developments in Electrical Linewidth and Overlay Met..:

Cresswell, Michael W. ; Sniegowski, Jeffry J. ; Ghoshtagore, Rathindra N....
Japanese Journal of Applied Physics. 35 (1996) 12S - p. 6597 , 1996

Link: https://doi.org/10.1143/..

11

Minimum test chip sample size selection for characterizing ..:

Suehle, J. S ; Linholm, L. W ; Kafadar, K
https://zenodo.org/record/1275173. , 1984

Link: https://zenodo.org/recor..

12

Test structure for the in-plane locations of project featur..:

Cresswell, M. W ; Allen, R. A ; Linholm, L. W...
https://zenodo.org/record/1271117. , 1970

Link: https://zenodo.org/recor..

13

A new method to measure the distance between graduation lin..:

Penzes, W. B ; Allen, R. A ; Cresswell, M. W..
https://zenodo.org/record/1260797. , 1970

Link: https://zenodo.org/recor..

14

Metrology standards for advanced semiconductor lithography ..:

Teague, E. C ; Linholm, L. W ; Cresswell, M. W...
https://zenodo.org/record/1271119. , 1970

Link: https://zenodo.org/recor..

15

Test patterns NBS-28 and NBS-28A : random fault interconnec..:

Mitchell, Michael A ; Linholm, Loren W ; United States. National Bureau of Standards. Special publication..
http://hdl.handle.net/2027/mdp.39015077586009. , 1981

Link: http://hdl.handle.net/20..