Magoshi, Shunko
12  Ergebnisse:
Personensuche X
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1

Application of Extreme Ultraviolet Lithography to Test Chip..:

Tawarayama, Kazuo ; Nakajima, Yumi ; Kyoh, Suigen...
Japanese Journal of Applied Physics.  50 (2011)  6S - p. 06GB08 , 2011
 
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2

Application of Extreme Ultraviolet Lithography to Test Chip..:

Tawarayama, Kazuo ; Nakajima, Yumi ; Kyoh, Suigen...
Japanese Journal of Applied Physics.  50 (2011)  6S - p. 06GB08 , 2011
 
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3

Resolution Enhancement for Beyond-22-nm Node Using Extreme ..:

Tawarayama, Kazuo ; Aoyama, Hajime ; Matsunaga, Kentaro...
Japanese Journal of Applied Physics.  49 (2010)  6S - p. 06GD01 , 2010
 
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4

Lithographic Performance of Extreme Ultravolet Full-Field E..:

Tawarayama, Kazuo ; Aoyama, Hajime ; Kamo, Takashi...
Japanese Journal of Applied Physics.  48 (2009)  6S - p. 06FA02 , 2009
 
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6

Improved Electron-Beam/Deep-Ultraviolet Intralevel Mix-and-..:

Magoshi, Shunko ; Niiyama, Hiromi ; Sato, Shinji...
Japanese Journal of Applied Physics.  38 (1999)  4R - p. 2169 , 1999
 
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8

Contamination Charging up Effect in a Variably Shaped Elect..:

Ando, Atsushi ; Sunaoshi, Hitoshi ; Sato, Shinji...
Japanese Journal of Applied Physics.  35 (1996)  12S - p. 6426 , 1996
 
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11

Patterning Accuracy Estimation of Electron Beam Direct-Writ..:

Hattori, Kiyoshi ; Magoshi, Shunko ; Sunaoshi, Hitoshi...
Japanese Journal of Applied Physics.  33 (1994)  12S - p. 6966 , 1994
 
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12

High-Speed Electron Beam Data Conversion System Combining H..:

Magoshi, Shunko ; Koyama, Kiyomi ; Ikenaga, Osamu...
Japanese Journal of Applied Physics.  31 (1992)  12S - p. 4257 , 1992
 
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