Maitrejean, S.
55  Ergebnisse:
Personensuche X
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1

3D sequential integration with Si CMOS stacked on 28nm indu..:

, In: 2023 International Electron Devices Meeting (IEDM),
Mota-Frutuoso, T. ; Lapras, V. ; Brunet, L.... - p. 1-4 , 2023
 
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2

3D sequential integration: applications and associated key ..:

, In: 2021 IEEE International Electron Devices Meeting (IEDM),
Batude, P. ; Billoint, O. ; Thuries, S.... - p. 3.2.1-3.2.4 , 2021
 
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3

Converting SOI to sSOI through Amorphization and Crystalliz..:

Maitrejean, S. ; Loubet, N. ; Augendre, E....
ECS Journal of Solid State Science and Technology.  4 (2015)  9 - p. P376-P381 , 2015
 
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7

Impact of Oxidation on Ge2Sb2Te5and GeTe Phase-Change Prope..:

Gourvest, E. ; Pelissier, B. ; Vallée, C....
Journal of The Electrochemical Society.  159 (2012)  4 - p. H373-H377 , 2012
 
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8

Lowering the Reset Current and Power Consumption of Phase-C..:

, In: 2012 4th IEEE International Memory Workshop,
Hubert, Q. ; Jahan, C. ; Toffoli, A.... - p. 1-4 , 2012
 
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10

Carbon-doped Ge2Sb2Te5 phase-change memory devices featurin..:

, In: 2012 Proceedings of the European Solid-State Device Research Conference (ESSDERC),
Hubert, Q. ; Jahan, C. ; Toffoli, A.... - p. 286-289 , 2012
 
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13

Evidence of Heterogeneous Strain during Crystallization of ..:

Fillot, F. ; Loubriat, S. ; Gergaud, P..
Electrochemical and Solid-State Letters.  14 (2011)  7 - p. H285-H287 , 2011
 
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15

Analysis by simulation of amorphization current in phase ch..:

Cueto, O. ; Jahan, C. ; Sousa, V....
Microelectronic Engineering.  88 (2011)  5 - p. 827-832 , 2011
 
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