E-LIB Suche - Ergebnisse für: Masamichi Akazawa, Masamichi Akazawa

1

Fluorinated Carbon Films with Low Dielectric Constant Made ..:

Cristian Petrica Lungu, Cristian Petrica Lungu ; Ana Mihaela Lungu, Ana Mihaela Lungu ; Masamichi Akazawa, Masamichi Akazawa...
Japanese Journal of Applied Physics. 38 (1999) 12B - p. L1544 , 1999

Link: https://doi.org/10.1143/..

2

Directional Single-Electron-Tunneling Junction:

Masamichi Akazawa, Masamichi Akazawa ; Yoshihito Amemiya, Yoshihito Amemiya
Japanese Journal of Applied Physics. 35 (1996) 6R - p. 3569 , 1996

Link: https://doi.org/10.1143/..

3

Reduction in Gap State Density near Valence Band Edge at Al..:

Jiao, Yining ; Nukariya, Takahide ; Takatsu, Umi...
physica status solidi (b). , 2024

Link: https://doi.org/10.1002/..

4

Investigation of dominance in near-surface region on electr..:

Ochi, Ryota ; Togashi, Takuya ; Osawa, Yoshito...
Applied Physics Express. 16 (2023) 9 - p. 091002 , 2023

Link: https://doi.org/10.35848..

5

Effects of low-temperature annealing on net doping profile ..:

Luo, Yuliu ; Hatakeyama, Yuki ; Akazawa, Masamichi
Japanese Journal of Applied Physics. 62 (2023) 12 - p. 126501 , 2023

Link: https://doi.org/10.35848..

6

Effects of Long-Term Low-Temperature Annealing on Lightly M..:

, In: 2023 21st International Workshop on Junction Technology (IWJT),

Akazawa, Masamichi ; Luo, Yuliu ; Hatakeyama, Yuki - p. 1-2 , 2023

Link: https://doi.org/10.23919..

7

Encapsulant-Dependent Effects of Long-Term Low-Temperature ..:

Akazawa, Masamichi ; Murai, Shunta ; Kachi, Tetsu
Journal of Electronic Materials. 51 (2022) 4 - p. 1731-1739 , 2022

Link: https://doi.org/10.1007/..

8

Detection of defect levels in vicinity of Al2O3/p-type GaN ..:

Akazawa, Masamichi ; Tamamura, Yuya ; Nukariya, Takahide...
Journal of Applied Physics. 132 (2022) 19 - p. , 2022

Link: https://doi.org/10.1063/..

9

X-ray photoelectron spectroscopy study on effects of ultra-..:

Akazawa, Masamichi ; Wu, Encheng ; Sakurai, Hideki...
Japanese Journal of Applied Physics. 60 (2021) 3 - p. 036503 , 2021

Link: https://doi.org/10.35848..

10

Corrigendum: "Effects of surface treatment on Fermi level p..:

Isobe, Kazuki ; Akazawa, Masamichi
Japanese Journal of Applied Physics. 60 (2021) 1 - p. 019301 , 2021

Link: https://doi.org/10.35848..

11

Analysis of simultaneous occurrence of shallow surface Ferm..:

Akazawa, Masamichi ; Kamoshida, Ryo
Japanese Journal of Applied Physics. 59 (2020) 9 - p. 096502 , 2020

Link: https://doi.org/10.35848..

12

Low-temperature annealing behavior of defects in Mg-ion-imp..:

Akazawa, Masamichi ; Kamoshida, Ryo ; Murai, Shunta..
Japanese Journal of Applied Physics. 60 (2020) 1 - p. 016502 , 2020

Link: https://doi.org/10.35848..

13

Effects of surface treatment on Fermi level pinning at meta..:

Isobe, Kazuki ; Akazawa, Masamichi
Japanese Journal of Applied Physics. 59 (2020) 4 - p. 046506 , 2020

Link: https://doi.org/10.35848..

14

Control of plasma-CVD SiO2/InAlN interface by N2O plasma ox..:

Akazawa, Masamichi ; Kitajima, Shouhei ; Kitawaki, Yuya
Japanese Journal of Applied Physics. 58 (2019) 10 - p. 106504 , 2019

Link: https://doi.org/10.7567/..

15

Impact of low-temperature annealing on defect levels genera..:

Akazawa, Masamichi ; Uetake, Kei
Japanese Journal of Applied Physics. 58 (2019) SC - p. SCCB10 , 2019

Link: https://doi.org/10.7567/..