Mehandru, R. ( author )
41  Ergebnisse:
Personensuche X
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9

Process Innovations for Future Technology Nodes with Back-S..:

, In: 2023 International Electron Devices Meeting (IEDM),
Kobrinsky, M. ; Silva, J. D ; Mannebach, E.... - p. 1-4 , 2023
 
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10

Novel Cell Architectures with Back-side Transistor Contacts..:

, In: 2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits),
Kobrinsky, M. ; Silva, J. D ; Mannebach, E.... - p. 1-2 , 2023
 
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11

Process modeling for advanced device technologies:

Cea, S. M. ; Botelho, S. ; Chaudhry, A....
Journal of Computational Electronics.  13 (2013)  1 - p. 18-32 , 2013
 
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12

Small signal measurement of Sc2O3 AlGaN/GaN moshemts:

Luo, B. ; Mehandru, R. ; Kang, B.S....
Solid-State Electronics.  48 (2004)  2 - p. 355-358 , 2004
 
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13

Effect of deposition conditions and annealing on W Schottky..:

Mehandru, R ; Kang, S ; Kim, S...
Materials Science in Semiconductor Processing.  7 (2004)  1-2 - p. 95-98 , 2004
 
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14

Hydrogen-induced reversible changes in drain current in Sc2..:

Kang, B. S. ; Mehandru, R. ; Kim, S....
Applied Physics Letters.  84 (2004)  23 - p. 4635-4637 , 2004
 
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15

AlGaN/GaN metal–oxide–semiconductor high electron mobility ..:

Mehandru, R. ; Luo, B. ; Kim, J....
Applied Physics Letters.  82 (2003)  15 - p. 2530-2532 , 2003
 
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