Miyawaki, Yudai
28  Ergebnisse:
Personensuche X
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1

Silicon nitride etching performance of CH2F2plasma diluted ..:

Kondo, Yusuke ; Ishikawa, Kenji ; Hayashi, Toshio...
Japanese Journal of Applied Physics.  54 (2015)  4 - p. 040303 , 2015
 
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2

CF3+fragmentation by electron impact ionization of perfluor..:

Kondo, Yusuke ; Ishikawa, Kenji ; Hayashi, Toshio...
Japanese Journal of Applied Physics.  54 (2015)  4 - p. 040301 , 2015
 
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3

Hydrofluorocarbon ion density of argon- or krypton-diluted ..:

Kondo, Yusuke ; Miyawaki, Yudai ; Ishikawa, Kenji...
Journal of Physics D: Applied Physics.  48 (2015)  4 - p. 045202 , 2015
 
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5

Etching Enhancement Followed by Nitridation on Low-k SiOCH ..:

Miyawaki, Yudai ; Shibata, Emi ; Kondo, Yusuke...
Japanese Journal of Applied Physics.  52 (2013)  2R - p. 020204 , 2013
 
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6

Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect..:

Fukasawa, Masanaga ; Miyawaki, Yudai ; Kondo, Yusuke...
Japanese Journal of Applied Physics.  51 (2012)  2R - p. 026201 , 2012
 
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7

Highly Selective Etching of SiO2 over Si3N4 and Si in Capac..:

Miyawaki, Yudai ; Kondo, Yusuke ; Sekine, Makoto...
Japanese Journal of Applied Physics.  52 (2012)  1R - p. 016201 , 2012
 
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8

Vacuum Ultraviolet and Ultraviolet Radiation-Induced Effect..:

Fukasawa, Masanaga ; Miyawaki, Yudai ; Kondo, Yusuke...
Japanese Journal of Applied Physics.  51 (2012)  2R - p. 026201 , 2012
 
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9

Reactive Ion Etching of Carbon Nanowalls:

Kondo, Shingo ; Kondo, Hiroki ; Miyawaki, Yudai...
Japanese Journal of Applied Physics.  50 (2011)  7R - p. 075101 , 2011
 
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11

Reactive Ion Etching of Carbon Nanowalls:

Kondo, Shingo ; Kondo, Hiroki ; Miyawaki, Yudai...
Japanese Journal of Applied Physics.  50 (2011)  7R - p. 075101 , 2011
 
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