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X
Moriyama, Yoshihiko
143  Ergebnisse:
Personensuche X
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1

(Invited) In-Situ Doped Epitaxial Growth of Highly Dopant-A..:

Moriyama, Yoshihiko ; Kamimuta, Yuuichi ; Ikeda, Keiji..
ECS Transactions.  75 (2016)  8 - p. 373-385 , 2016
Link: https://doi.org/10.1149/..
 
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2

Characterization of locally strained Ge1−xSnx/Ge fine struc..:

Ike, Shinichi ; Nakatsuka, Osamu ; Moriyama, Yoshihiko...
Applied Physics Letters.  106 (2015)  18 - p. , 2015
Link: https://doi.org/10.1063/..
 
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3

(Invited) Mobility Enhancement of Uniaxially Strained Germa..:

Ikeda, Keiji ; Kamimuta, Yuuichi ; Moriyama, Yoshihiko...
ECS Transactions.  64 (2014)  6 - p. 347-355 , 2014
Link: https://doi.org/10.1149/..
 
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4

Ultrathin-body Ge-on-insulator wafers fabricated with stron..:

Moriyama, Yoshihiko ; Ikeda, Keiji ; Takeuchi, Shotaro...
Applied Physics Express.  7 (2014)  8 - p. 086501 , 2014
Link: https://doi.org/10.7567/..
 
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5

Formation and characterization of locally strained Ge1−Sn /..:

Ike, Shinichi ; Moriyama, Yoshihiko ; Kurosawa, Masashi...
Thin Solid Films.  557 (2014)  - p. 164-168 , 2014
Link: https://doi.org/10.1016/..
 
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6

(Invited) Ge-on-Insulator MOSFETs for High-Performance and ..:

Tezuka, Tsutomu ; Ikeda, Keiji ; Kamata, Yoshiki...
ECS Transactions.  64 (2014)  11 - p. 135-147 , 2014
Link: https://doi.org/10.1149/..
 
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7

In situ doped epitaxial growth of highly dopant-activated n..:

Moriyama, Yoshihiko ; Kamimuta, Yuuichi ; Kamata, Yoshiki...
Applied Physics Express.  7 (2014)  10 - p. 106501 , 2014
Link: https://doi.org/10.7567/..
 
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8

(Invited) Strained Germanium Nanowire MOSFET with Low-Paras..:

Ikeda, Keiji ; Kamimuta, Yuuichi ; Moriyama, Yoshihiko...
ECS Transactions.  61 (2014)  3 - p. 137-145 , 2014
Link: https://doi.org/10.1149/..
 
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9

Fabrication of bonded GeOI substrates with thin Al2O3/SiO2 ..:

Moriyama, Yoshihiko ; Ikeda, Keiji ; Kamimuta, Yuuichi...
Solid-State Electronics.  83 (2013)  - p. 42-45 , 2013
Link: https://doi.org/10.1016/..
 
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10

Characterization of Local Strain Structures in Heteroepitax..:

Ike, Shinichi ; Moriyama, Yoshihiko ; Kurosawa, Masashi...
ECS Transactions.  58 (2013)  9 - p. 185-192 , 2013
Link: https://doi.org/10.1149/..
 
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11

(Invited) GOI Substrates: Fabrication and Characterization:

Sakai, Akira ; Yamasaka, Shuto ; Kikkawa, Jun...
ECS Transactions.  50 (2013)  9 - p. 709-725 , 2013
Link: https://doi.org/10.1149/..
 
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12

Generation of uniaxial tensile strain of over 1% on a Ge su..:

Moriyama, Yoshihiko ; Kamimuta, Yuuichi ; Ikeda, Keiji.
Thin Solid Films.  520 (2012)  8 - p. 3236-3239 , 2012
Link: https://doi.org/10.1016/..
 
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13

Introduction of local tensile strain on Ge substrates by Si..:

Moriyama, Yoshihiko ; Kamimuta, Yuuichi ; Ikeda, Keiji.
Solid-State Electronics.  60 (2011)  1 - p. 89-92 , 2011
Link: https://doi.org/10.1016/..
 
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14

Single Source Heterojunction Metal–Oxide–Semiconductor Tran..:

Mizuno, Tomohisa ; Moriyama, Yoshihiko ; Tezuka, Tsutomu..
Japanese Journal of Applied Physics.  50 (2011)  1R - p. 010107 , 2011
Link: https://doi.org/10.7567/..
 
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15

Single Source Heterojunction Metal–Oxide–Semiconductor Tran..:

Mizuno, Tomohisa ; Moriyama, Yoshihiko ; Tezuka, Tsutomu..
Japanese Journal of Applied Physics.  50 (2011)  1R - p. 010107 , 2011
Link: https://doi.org/10.1143/..
 
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