E-LIB Suche - Ergebnisse für: Nagahata, Kazunori

1

Enhanced etching of tin-doped indium oxide due to surface m..:

Li, Hu ; Karahashi, Kazuhiro ; Friederich, Pascal...
Japanese Journal of Applied Physics. 57 (2018) 6S2 - p. 06JC05 , 2018

Link: https://doi.org/10.7567/..

2

Cyclic etching of tin-doped indium oxide using hydrogen-ind..:

Hirata, Akiko ; Fukasawa, Masanaga ; Nagahata, Kazunori...
Japanese Journal of Applied Physics. 57 (2018) 6S2 - p. 06JB02 , 2018

Link: https://doi.org/10.7567/..

3

Effects of hydrogen-damaged layer on tin-doped indium oxide..:

Hirata, Akiko ; Fukasawa, Masanaga ; Shigetoshi, Takushi...
Japanese Journal of Applied Physics. 56 (2017) 6S2 - p. 06HD02 , 2017

Link: https://doi.org/10.7567/..

4

Mass-selected ion beam study on etching characteristics of ..:

Li, Hu ; Karahashi, Kazuhiro ; Fukasawa, Masanaga...
Japanese Journal of Applied Physics. 55 (2016) 2 - p. 021202 , 2016

Link: https://doi.org/10.7567/..

5

Molecular dynamics simulation of silicon oxidation enhanced..:

Mizotani, Kohei ; Isobe, Michiro ; Fukasawa, Masanaga...
Journal of Physics D: Applied Physics. 48 (2015) 15 - p. 152002 , 2015

Link: https://doi.org/10.1088/..

6

Control of SiO2/Si interface defects generation during thin..:

Shigetoshi, Takushi ; Fukasawa, Masanaga ; Nagahata, Kazunori.
Japanese Journal of Applied Physics. 54 (2015) 6S2 - p. 06GB05 , 2015

Link: https://doi.org/10.7567/..

7

Characterization of polymer layer formation during SiO2/SiN..:

Miyake, Keita ; Ito, Tomoko ; Isobe, Michiro...
Japanese Journal of Applied Physics. 53 (2014) 3S2 - p. 03DD02 , 2014

Link: https://doi.org/10.7567/..

8

Wavelength Dependence of Photon-Induced Interface Defects i..:

Fukasawa, Masanaga ; Matsugai, Hiroyasu ; Honda, Takahiro...
Japanese Journal of Applied Physics. 52 (2013) 5S2 - p. 05ED01 , 2013

Link: https://doi.org/10.7567/..

9

Mechanism of plasma-induced damage to low-k SiOCH films dur..:

Takeda, Keigo ; Miyawaki, Yudai ; Takashima, Seigo...
Journal of Applied Physics. 109 (2011) 3 - p. , 2011

Link: https://doi.org/10.1063/..

10

Analysis of Plasma Wall Reactions Using Virtual Optical Emi..:

Kuboi, Nobuyuki ; Fukasawa, Masanaga ; Kawashima, Atsushi...
Japanese Journal of Applied Physics. 49 (2010) 8S1 - p. 08JD01 , 2010

Link: https://doi.org/10.1143/..

11

Prediction of Fluctuations in Plasma–Wall Interactions Usin..:

Fukasawa, Masanaga ; Kawashima, Atsushi ; Kuboi, Nobuyuki...
Japanese Journal of Applied Physics. 48 (2009) 8 - p. 08HC01 , 2009

Link: https://doi.org/10.1143/..

12

Plasma damage mechanisms for low-k porous SiOCH films due t..:

Uchida, Saburo ; Takashima, Seigo ; Hori, Masaru...
Journal of Applied Physics. 103 (2008) 7 - p. , 2008

Link: https://doi.org/10.1063/..

13

Evaluation of Property Changes due to Radiation, Radicals, ..:

Uchida, Saburo ; Takashima, Seigo ; Hori, Masaru...
Japanese Journal of Applied Physics. 47 (2008) 5R - p. 3621 , 2008

Link: https://doi.org/10.1143/..

14

Flow Characteristics of Air-Solids Mixture in a Horizontal ..:

TAKEGAWA, Tomihiko ; HAZAMA, Yuhji ; NAGAHATA, Kazunori.
Bulletin of JSME. 22 (1979) 170 - p. 1107-1112 , 1979

Link: https://doi.org/10.1299/..

15

Enhanced etching of tin-doped indium oxide due to surface m..:

Li, Hu ; Karahashi, Kazuhiro ; Friederich, Pascal...
info:eu-repo/semantics/altIdentifier/wos/000439396800010. , 2018

Link: https://publikationen.bi..