Naruoka, Takehiko
10  Ergebnisse:
Personensuche X
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1

Novel EUV Photoresist for Sub-7 nm Node:

Suzuki, Junya ; Furukawa, Tsuyoshi ; Miyata, Hiromu...
Journal of Photopolymer Science and Technology.  30 (2017)  6 - p. 671-674 , 2017
 
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2

Novel High Sensitivity EUV Photoresist for Sub-7 nm Node:

Nagai, Tomoki ; Nakagawa, Hisashi ; Naruoka, Takehiko...
Journal of Photopolymer Science and Technology.  29 (2016)  3 - p. 475-478 , 2016
 
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3

Novel EUV Resist Development for Sub-14nm Half Pitch:

Kimoto, Takakazu ; Naruoka, Takehiko ; Nakagawa, Hisashi...
Journal of Photopolymer Science and Technology.  28 (2015)  4 - p. 519-523 , 2015
 
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4

Novel EUV Resists Materials for 16nm HP and beyond:

Sakai, Kazunori ; Shiratani, Motohiro ; Fujisawa, Tomohisa...
Journal of Photopolymer Science and Technology.  27 (2014)  5 - p. 639-644 , 2014
 
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5

Recent EUV Resists toward High Volume Manufacturing:

Nakagawa, Hisashi ; Naruoka, Takehiko ; Nagai, Tomoki
Journal of Photopolymer Science and Technology.  27 (2014)  6 - p. 739-746 , 2014
 
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6

Development of Directed Self-Assembly Materials for Sub 10 ..:

Komatsu, Hiroyuki ; Hori, Masafumi ; Minegishi, Shinya..
Journal of Photopolymer Science and Technology.  27 (2014)  4 - p. 425-429 , 2014
 
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7

Directed Self Assembly Materials for Semiconductor Lithogra..:

Minegishi, Shinya ; Naruoka, Takehiko ; Nagai, Tomoki
Journal of Photopolymer Science and Technology.  26 (2013)  6 - p. 793-800 , 2013
 
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8

Directed Self Assembly Material Development for Fine Patter..:

Minegishi, Shinya ; Namie, Yuji ; Izumi, Kenichi...
Journal of Photopolymer Science and Technology.  26 (2013)  1 - p. 27-30 , 2013
 
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