E-LIB Suche - Ergebnisse für: Nishiyama, Iwao

1

Transportation of hydrogen radicals for cleaning extreme ul..:

Kuroki, Yuya ; Funakoshi, Naoto ; Nishiyama, Iwao.
Thin Solid Films. 575 (2015) - p. 110-112 , 2015

Link: https://doi.org/10.1016/..

2

Cleaning technology for EUV multilayer mirror using atomic ..:

Motai, Kumi ; Oizumi, Hiroaki ; Miyagaki, Shinji...
Thin Solid Films. 516 (2008) 5 - p. 839-843 , 2008

Link: https://doi.org/10.1016/..

3

Reduction of oxide layer on various metal surfaces by atomi..:

Izumi, Akira ; Ueno, Tomoya ; Miyazaki, Yasuo..
Thin Solid Films. 516 (2008) 5 - p. 853-855 , 2008

Link: https://doi.org/10.1016/..

4

Performance and quality analysis of Mo–Si multilayers forme..:

Hiruma, Kenji ; Miyagaki, Shinji ; Yamanashi, Hiromasa..
Thin Solid Films. 516 (2008) 8 - p. 2050-2057 , 2008

Link: https://doi.org/10.1016/..

5

LER evaluation of molecular resist for EUV lithography:

Shiono, Daiju ; Hada, Hideo ; Yukawa, Hiroto...
Microelectronic Engineering. 84 (2007) 5-8 - p. 1084-1087 , 2007

Link: https://doi.org/10.1016/..

6

Impact of Slanted Absorber Side Walls on Critical Dimension..:

Sugawara, Minoru ; Nishiyama, Iwao
Japanese Journal of Applied Physics. 46 (2007) 1R - p. 84 , 2007

Link: https://doi.org/10.1143/..

7

Methodology of Merging Optical-Proximity-Effect Correction ..:

Sugawara, Minoru ; Nishiyama, Iwao
Japanese Journal of Applied Physics. 46 (2007) 10R - p. 6554 , 2007

Link: https://doi.org/10.1143/..

8

Progress in EUV Resist Development:

Shimizu, Daisuke ; Maruyama, Ken ; Saitou, Akio...
Journal of Photopolymer Science and Technology. 20 (2007) 3 - p. 423-428 , 2007

Link: https://doi.org/10.2494/..

9

Evaluation of New Molecular Resist for EUV Lithography:

Oizumi, Hiroaki ; Tanaka, Yuusuke ; Kumise, Takaaki...
Journal of Photopolymer Science and Technology. 20 (2007) 3 - p. 403-410 , 2007

Link: https://doi.org/10.2494/..

10

Atomic Hydrogen Cleaning of Surface Ru Oxide Formed by Extr..:

Oizumi, Hiroaki ; Izumi, Akira ; Motai, Kumi..
Japanese Journal of Applied Physics. 46 (2007) 7L - p. L633 , 2007

Link: https://doi.org/10.1143/..

11

Patterning capability of new molecular resist in EUV lithog..:

Oizumi, Hiroaki ; Tanaka, Yuusuke ; Kumise, Takaaki...
Microelectronic Engineering. 84 (2007) 5-8 - p. 1049-1053 , 2007

Link: https://doi.org/10.1016/..

12

Performance of molecular resist based on polyphenol in EUV ..:

Oizumi, Hiroaki ; Kumasaka, Fumiaki ; Tanaka, Yuusuke...
Microelectronic Engineering. 83 (2006) 4-9 - p. 1107-1110 , 2006

Link: https://doi.org/10.1016/..

13

Analysis of Printability of Scratch Defect on Reflective Ma..:

Sugawara, Minoru ; Nishiyama, Iwao ; Motai, Kumi.
Japanese Journal of Applied Physics. 45 (2006) 12R - p. 9044 , 2006

Link: https://doi.org/10.1143/..

14

Performance of dilatometer for determining absolute CTE of ..:

Takeichi, Yoshimasa ; Nishiyama, Iwao ; Yamada, Naofumi
Microelectronic Engineering. 83 (2006) 4-9 - p. 1617-1620 , 2006

Link: https://doi.org/10.1016/..

15

Evaluation of Resist Capability for EUV Lithography:

Oizumi, Hiroaki ; Tanaka, Yusuke ; Shiono, Daiji...
Journal of Photopolymer Science and Technology. 19 (2006) 4 - p. 507-514 , 2006

Link: https://doi.org/10.2494/..